Trubbach
Switzerland
54
2025-06-12
51
2026-04-07
These are the the leading inventors for applications assigned to EVATEC AG:
EVATEC AG based in Trubbach, CH has been assigned the rights to these inventions. The list includes both Pending Applications and Patent Grants:
VACUUM LAYER DEPOSITION APPARATUS AND METHOD OF DEPOSITING A LAYER ON A SUBSTRATE, ESPECIALLY ON A SUBSTRATE COMPRISING INDENTATIONS IN THE SURFACE TO BE COATED
#2 | 2024-04-25 ✅ Patent 12,272,525 granted on 2025-04-08Sputtering apparatus for coating of 3D-objects
#3 | 2024-04-18 ✅ Patent 12,604,700 granted on 2026-04-14VACUUM TREATMENT APPARATUS AND METHODS FOR MANUFACTURING VACUUM TREATED SUBSTRATES
#4 | 2024-02-15 ✅ Patent 12,493,016 granted on 2025-12-09MEASURING DEVICE AND METHOD FOR MEASURING PARAMETERS OF A PIEZOELECTRIC CRYSTAL ONTO WHICH A THIN FILM OF MATERIAL IS DEPOSITED AS WELL AS THIN-FILM DEPOSITION SYSTEMS WITH SUCH A DEVICE AND A METHOD FOR CONTROLLING SUCH SYSTEMS
#5 | 2023-01-19 ✅ Patent 11,848,179 granted on 2023-12-19Methods of and apparatus for magnetron sputtering
#6 | 2022-08-18 ✅ Patent 12,426,506 granted on 2025-09-23PIEZOELECTRIC COATING AND DEPOSITION PROCESS
#7 | 2022-03-31 ✅ Patent 12,209,302 granted on 2025-01-28Vacuum system and method to deposit a compound layer
#8 | 2021-12-09 ✅ Patent 12,389,797 granted on 2025-08-12DEPOSITION PROCESS FOR PIEZOELECTRIC COATINGS
#9 | 2021-12-09 ✅ Patent 11,952,654 granted on 2024-04-09Liquid sputter target
#10 | 2021-11-18 ✅ Patent 11,380,520 granted on 2022-07-05RF power delivery to vacuum plasma processing
#11 | 2021-05-13 ✅ Patent 12,211,715 granted on 2025-01-28Substrate vacuum treatment apparatus and method therefor
#12 | 2021-02-18 ✅ Patent 11,476,099 granted on 2022-10-18Methods of and apparatus for magnetron sputtering
#13 | 2020-12-10 ✅ Patent 11,551,950 granted on 2023-01-10Substrate processing apparatus and method of processing a substrate and of manufacturing a processed workpiece
#14 | 2020-12-10 ✅ Patent 11,380,530 granted on 2022-07-05Reactive sputtering with HIPIMS
#15 | 2020-10-01 ✅ Patent 11,217,434 granted on 2022-01-04RF capacitive coupled dual frequency etch reactor
#16 | 2020-07-09PERMEATION-BARRIER
#17 | 2020-06-11 ✅ Patent 11,377,728 granted on 2022-07-05Broadband optical monitoring
#18 | 2019-11-14 ✅ Patent 10,580,671 granted on 2020-03-03Chamber for degassing substrates
#19 | 2019-11-07 ✅ Patent 11,469,085 granted on 2022-10-11Vacuum plasma workpiece treatment apparatus
#20 | 2019-11-07 ✅ Patent 11,742,187 granted on 2023-08-29RF capacitive coupled etch reactor
#21 | 2019-10-03 ✅ Patent 11,387,079 granted on 2022-07-12Plasma etch chamber and method of plasma etching
#22 | 2019-08-15 ✅ Patent 11,145,495 granted on 2021-10-12Vacuum treatment chamber and method of manufacturing a vacuum treated plate-shaped substrate
#23 | 2019-03-28 ✅ Patent 11,776,825 granted on 2023-10-03Chamber for degassing substrates
#24 | 2019-03-28 ✅ Patent 10,590,538 granted on 2020-03-17Vacuum treatment apparatus
#25 | 2018-09-13APPARATUS AND METHOD ESPECIALLY FOR DEGASSING OF SUBSTRATES
#26 | 2018-08-30 ✅ Patent 10,889,890 granted on 2021-01-12Vacuum processing apparatus and method for vacuum processing substrates
#27 | 2018-06-21 ✅ Patent 10,403,522 granted on 2019-09-03Chamber for degassing substrates
#28 | 2018-01-25 ✅ Patent 12,249,523 granted on 2025-03-11Wafer holder and temperature conditioning arrangement and method of manufacturing a wafer
#29 | 2017-07-20 ✅ Patent 10,202,682 granted on 2019-02-12Method of sputtering and sputter system
#30 | 2017-04-27ELECTRO-STATIC CHUCK WITH RADIOFREQUENCY SHUNT
#31 | 2017-01-12 ✅ Patent 10,388,559 granted on 2019-08-20Apparatus for depositing a layer on a substrate in a processing gas
#32 | 2016-11-17 ✅ Patent 9,934,992 granted on 2018-04-03Chamber for degassing substrates
#33 | 2016-09-15 ✅ Patent 10,138,553 granted on 2018-11-27Vacuum treatment apparatus
#34 | 2016-08-18 ✅ Patent 11,211,234 granted on 2021-12-28Arc suppression and pulsing in high power impulse magnetron sputtering (HIPIMS)
#35 | 2016-06-16 ✅ Patent 11,143,416 granted on 2021-10-12Radiation heater arrangement
#36 | 2015-12-31 ✅ Patent 10,066,287 granted on 2018-09-04Direct liquid deposition
#37 | 2015-12-24 ✅ Patent 9,624,572 granted on 2017-04-18Method of HIPIMS sputtering and HIPIMS sputter system
#38 | 2015-06-25 ✅ Patent 9,607,831 granted on 2017-03-28Method for depositing an aluminium nitride layer
#39 | 2015-05-21 ✅ Patent 9,478,420 granted on 2016-10-25Method for depositing a group III nitride semiconductor film
#40 | 2015-05-21 ✅ Patent 10,295,110 granted on 2019-05-21Adapter for vacuum-insulated lines
#41 | 2014-11-27 ✅ Patent 10,347,515 granted on 2019-07-09Method for manufacturing workpieces and apparatus
#42 | 2014-03-27 ✅ Patent 9,396,981 granted on 2016-07-19Vacuum treatment apparatus
#43 | 2013-12-26 ✅ Patent 9,694,990 granted on 2017-07-04Transport and handing-over arrangement for disc-shaped substrates, vacuum treatment installation and method for manufacture treated substrates
#44 | 2013-10-31 ✅ Patent 9,490,166 granted on 2016-11-08Apparatus and method for depositing a layer onto a substrate
#45 | 2013-09-26 ✅ Patent 9,719,177 granted on 2017-08-01In-situ conditioning for vacuum processing of polymer substrates
#46 | 2013-08-29 ✅ Patent 10,692,707 granted on 2020-06-23RF substrate bias with high power impulse magnetron sputtering (HIPIMS)
#47 | 2013-04-25 ✅ Patent 9,593,407 granted on 2017-03-14Direct liquid deposition
#48 | 2013-02-28 ✅ Patent 9,793,144 granted on 2017-10-17Wafer holder and temperature conditioning arrangement and method of manufacturing a wafer
#49 | 2011-08-25 ✅ Patent 9,611,537 granted on 2017-04-04Target shaping
#50 | 2011-05-19 ✅ Patent 9,627,324 granted on 2017-04-18Apparatus and method for processing a substrate
#51 | 2010-05-27 ✅ Patent 10,224,188 granted on 2019-03-05RF sputtering arrangement
#52 | 2009-07-09 ✅ Patent 10,784,092 granted on 2020-09-22Reactive sputtering with HIPIMs
#53 | 2009-05-28 ✅ Patent 9,587,306 granted on 2017-03-07Method for producing a directional layer by cathode sputtering, and device for implementing the method
#54 | 2008-06-12 ✅ Patent 9,355,824 granted on 2016-05-31Arc suppression and pulsing in high power impulse magnetron sputtering (HIPIMS)
Also check out Evatec AG's (Trubbach, Switzerland) applicant profile with 37 patent applications submitted.
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