Netherlands
24
2014-09-18
24
2015-04-07
These are the the leading inventors for applications assigned to ASML Netherlands B.V.:
ASML Netherlands B.V. based in , NL has been assigned the rights to these inventions. The list includes both Pending Applications and Patent Grants:
Beam position control for an extreme ultraviolet light source
#2 | 2013-11-21 ✅ Patent 9,073,098 granted on 2015-07-07Light collector mirror cleaning
#3 | 2013-02-21 ✅ Patent 8,993,976 granted on 2015-03-31Energy sensors for light beam alignment
#4 | 2008-09-04 ✅ Patent 7,649,702 granted on 2010-01-19Immersion lithography objective
#5 | 2008-07-03 ✅ Patent 7,903,234 granted on 2011-03-08Lithographic apparatus, device manufacturing method and computer program product
#6 | 2007-07-19 ✅ Patent 7,692,881 granted on 2010-04-06Structure for use in a projection exposure system for manufacturing semiconductors
#7 | 2006-12-14 ✅ Patent 7,233,384 granted on 2007-06-19Lithographic apparatus and device manufacturing method, and device manufactured thereby for calibrating an imaging system with a sensor
#8 | 2006-07-27 ✅ Patent 7,423,727 granted on 2008-09-09Lithographic apparatus and device manufacturing method
#9 | 2006-06-29 ✅ Patent 7,265,813 granted on 2007-09-04Lithographic apparatus and device manufacturing method
#10 | 2006-06-29 ✅ Patent 7,242,458 granted on 2007-07-10Lithographic apparatus and device manufacturing method utilizing a multiple substrate carrier for flat panel display substrates
#11 | 2006-06-29 ✅ Patent 7,274,029 granted on 2007-09-25Lithographic apparatus and device manufacturing method
#12 | 2006-06-22 ✅ Patent 7,202,939 granted on 2007-04-10Lithographic apparatus and device manufacturing method
#13 | 2006-05-25 ✅ Patent 7,061,581 granted on 2006-06-13Lithographic apparatus and device manufacturing method
#14 | 2006-05-18 ✅ Patent 7,170,584 granted on 2007-01-30Lithographic apparatus and device manufacturing method
#15 | 2005-12-15 ✅ Patent 7,265,364 granted on 2007-09-04Level sensor for lithographic apparatus
#16 | 2005-11-17 ✅ Patent 7,259,828 granted on 2007-08-21Alignment system and method and device manufactured thereby
#17 | 2005-08-18 ✅ Patent 7,190,434 granted on 2007-03-13Lithographic apparatus and device manufacturing method
#18 | 2005-08-18 ✅ Patent 7,133,118 granted on 2006-11-07Lithographic apparatus and device manufacturing method
#19 | 2005-06-28 ✅ Patent 6,911,091 granted on 2005-06-28Environment exchange control for material on a wafer surface
#20 | 2005-05-10 ✅ Patent 6,891,134 granted on 2005-05-10Integrally formed bake plate unit for use in wafer fabrication system
#21 | 2005-04-12 ✅ Patent 6,879,063 granted on 2005-04-12Displacement device
#22 | 2005-03-17 ✅ Patent 6,927,835 granted on 2005-08-09Adaptive thermal control of lithographic chemical processes
#23 | 2005-03-03 ✅ Patent 7,280,228 granted on 2007-10-09System and method of measurement, system and method of alignment, lithographic apparatus and method
#24 | 2005-02-03 ✅ Patent 7,239,393 granted on 2007-07-03Calibration method for a lithographic apparatus and device manufacturing method
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