Netherlands
47
2007-12-04
47
2007-12-04
These are the the leading inventors for applications assigned to ASML Holding N.V.:
ASML Holding N.V. based in , NL has been assigned the rights to these inventions. The list includes both Pending Applications and Patent Grants:
System for using a two part cover for protecting a reticle
#2 | 2007-07-03 ✅ Patent 7,239,446 granted on 2007-07-03Optical reduction system with control of illumination polarization
#3 | 2007-02-15 ✅ Patent 7,369,214 granted on 2008-05-06Lithographic apparatus and device manufacturing method utilizing a metrology system with sensors
#4 | 2007-01-18 ✅ Patent 7,290,931 granted on 2007-11-06Vacuum pre-loaded pneumatic bearing with onboard vacuum generator
#5 | 2007-01-04 ✅ Patent 7,209,275 granted on 2007-04-24Method and system for maskless lithography real-time pattern rasterization and using computationally coupled mirrors to achieve optimum feature representation
#6 | 2007-01-04 ✅ Patent 7,375,791 granted on 2008-05-20Laminar flow gas curtains for lithographic applications
#7 | 2006-11-21 ✅ Patent 7,139,631 granted on 2006-11-21Method and system to compensate for scanner system timing variability in a semiconductor wafer fabrication system
#8 | 2006-08-17 ✅ Patent 7,278,817 granted on 2007-10-09Method for transferring and loading a reticle
#9 | 2006-06-20 ✅ Patent 7,063,920 granted on 2006-06-20Method for the generation of variable pitch nested lines and/or contact holes using fixed size pixels for direct-write lithographic systems
#10 | 2006-06-01 ✅ Patent 7,365,848 granted on 2008-04-29System and method using visible and infrared light to align and measure alignment patterns on multiple layers
#11 | 2006-05-30 ✅ Patent 7,052,919 granted on 2006-05-30Recipe cascading in a wafer processing system
#12 | 2006-05-09 ✅ Patent 7,041,172 granted on 2006-05-09Methods and apparatus for dispensing semiconductor processing solutions with multi-syringe fluid delivery systems
#13 | 2006-04-11 ✅ Patent 7,025,498 granted on 2006-04-11System and method of measuring thermal expansion
#14 | 2006-04-04 ✅ Patent 7,024,440 granted on 2006-04-04Method and system for processing a discrete time input signal where the clock rate of a discrete time output signal is a multiple of the clock rate of input signal samples
#15 | 2006-03-28 ✅ Patent 7,018,943 granted on 2006-03-28Method of uniformly coating a substrate
#16 | 2006-02-28 ✅ Patent 7,004,708 granted on 2006-02-28Apparatus for processing wafers
#17 | 2006-02-23 ✅ Patent 7,049,618 granted on 2006-05-23Virtual gauging method for use in lithographic processing
#18 | 2006-02-21 ✅ Patent 7,002,747 granted on 2006-02-21Diffuser plate and method of making same
#19 | 2006-02-07 ✅ Patent 6,994,444 granted on 2006-02-07Method and apparatus for managing actinic intensity transients in a lithography mirror
#20 | 2006-01-31 ✅ Patent 6,991,416 granted on 2006-01-31System and method for reticle protection and transport
#21 | 2006-01-10 ✅ Patent 6,984,836 granted on 2006-01-10System and method for monitoring the topography of a wafer surface during lithographic processing
#22 | 2005-12-27 ✅ Patent 6,978,658 granted on 2005-12-27Proximity sensor with self compensation for mechanism instability
#23 | 2005-12-22 ✅ Patent 7,389,813 granted on 2008-06-24Systems and methods for controlling local environment
#24 | 2005-12-20 ✅ Patent 6,977,716 granted on 2005-12-20Catadioptric lithography system and method with reticle stage orthogonal to wafer stage
#25 | 2005-12-20 ✅ Patent 6,977,098 granted on 2005-12-20Method of uniformly coating a substrate
#26 | 2005-12-01 ✅ Patent 7,298,459 granted on 2007-11-20Wafer handling method for use in lithography patterning
#27 | 2005-11-22 ✅ Patent 6,967,712 granted on 2005-11-22Apparatus and system for improving phase shift mask imaging performance and associated methods
#28 | 2005-11-22 ✅ Patent 6,966,364 granted on 2005-11-22Systems and methods for controlling local environment
#29 | 2005-10-18 ✅ Patent 6,955,720 granted on 2005-10-18Plasma deposition of spin chucks to reduce contamination of Silicon wafers
#30 | 2005-10-06 ✅ Patent 7,304,719 granted on 2007-12-04Patterned grid element polarizer
#31 | 2005-10-06 ✅ Patent 7,161,684 granted on 2007-01-09Apparatus for optical system coherence testing
#32 | 2005-10-06 ✅ Patent 7,153,616 granted on 2006-12-26System and method for verifying and controlling the performance of a maskless lithography tool
#33 | 2005-10-04 ✅ Patent 6,952,622 granted on 2005-10-04Robot pre-positioning in a wafer processing system
#34 | 2005-09-29 ✅ Patent 7,292,308 granted on 2007-11-06System and method for patterning a flexible substrate in a lithography tool
#35 | 2005-08-23 ✅ Patent 6,934,038 granted on 2005-08-23Method for optical system coherence testing
#36 | 2005-08-18 ✅ Patent 7,048,800 granted on 2006-05-23Semiconductor substrate processing apparatus
#37 | 2005-08-04 ✅ Patent 7,133,121 granted on 2006-11-07Methods and systems to compensate for a stitching disturbance of a printed pattern in a maskless lithography system utilizing overlap of exposure zones with attenuation of the aerial image in the overlap region
#38 | 2005-07-07 ✅ Patent 7,078,355 granted on 2006-07-18Method and system of coating polymer solution on surface of a substrate
#39 | 2005-06-23 ✅ Patent 7,241,342 granted on 2007-07-10Non-dripping nozzle apparatus
#40 | 2005-06-14 ✅ Patent 6,906,789 granted on 2005-06-14Magnetically levitated and driven reticle-masking blade stage mechanism having six degrees freedom of motion
#41 | 2005-04-28 ✅ Patent 7,256,865 granted on 2007-08-14Methods and apparatuses for applying wafer-alignment marks
#42 | 2005-03-31 ✅ Patent 7,023,526 granted on 2006-04-04Methods and systems to compensate for a stitching disturbance of a printed pattern in a maskless lithography system utilizing overlap without an explicit attenuation
#43 | 2005-03-15 ✅ Patent 6,867,846 granted on 2005-03-15Tailored reflecting diffractor for EUV lithographic system aberration measurement
#44 | 2005-03-03 ✅ Patent 6,947,125 granted on 2005-09-20Bearing arrangement for reaction mass in a controlled environment
#45 | 2005-02-03 ✅ Patent 6,984,474 granted on 2006-01-10Reticle barrier system for extreme ultra-violet lithography
#46 | 2005-01-18 ✅ Patent 6,844,027 granted on 2005-01-18Environment exchange control for material on a wafer surface
#47 | 2005-01-06 ✅ Patent 6,979,833 granted on 2005-12-27System for monitoring the topography of a wafer surface during lithographic processing
361232 ⎘