Tokyo
Japan
21
2022-12-29
15
2023-10-10
These are the the leading inventors for applications assigned to SPP TECHNOLOGIES CO., LTD.:
SPP TECHNOLOGIES CO., LTD. based in Tokyo, JP has been assigned the rights to these inventions. The list includes both Pending Applications and Patent Grants:
WIDE-GAP SEMICONDUCTOR SUBSTRATE, APPARATUS FOR MANUFACTURING WIDE-GAP SEMICONDUCTOR SUBSTRATE, AND METHOD FOR MANUFACTURING WIDE-GAP SEMICONDUCTOR SUBSTRATE
#2 | 2022-05-26 ✅ Patent 11,785,184 granted on 2023-10-10Maintenance support system, maintenance support method, and program
#3 | 2022-01-13 ✅ Patent 12,243,210 granted on 2025-03-04Maintenance support system, maintenance support method, program, method for generating processed image, and processed image
#4 | 2021-08-26 ✅ Patent 11,361,949 granted on 2022-06-14Substrate placing table, plasma processing apparatus provided with same, and plasma processing method
#5 | 2020-04-23Wide-Gap Semiconductor Substrate, Apparatus For Manufacturing Wide-Gap Semiconductor Substrate, And Method For Manufacturing Wide-Gap Semiconductor Substrate
#6 | 2019-03-21 ✅ Patent 10,559,459 granted on 2020-02-11Method for producing silicon nitride film and silicon nitride film
#7 | 2018-11-01 ✅ Patent 11,195,697 granted on 2021-12-07Plasma control apparatus
#8 | 2016-12-08Plasma Processing Apparatus and Coil Used Therein
#9 | 2016-06-02Heating Device and Plasma Processing Apparatus Provided Therewith
#10 | 2016-04-28Plasma Processing Apparatus and Opening and Closing Mechanism used therein
#11 | 2015-06-18Plasma Etching Device
#12 | 2014-08-07 ✅ Patent 9,117,660 granted on 2015-08-25Apparatus, method and program for manufacturing nitride film
#13 | 2014-07-03 ✅ Patent 9,123,542 granted on 2015-09-01Plasma etching method
#14 | 2013-05-09 ✅ Patent 8,859,434 granted on 2014-10-14Etching method
#15 | 2013-02-07 ✅ Patent 8,628,676 granted on 2014-01-14Plasma etching method
#16 | 2012-12-06 ✅ Patent 10,204,768 granted on 2019-02-12Etching device, plasma processing device
#17 | 2012-10-11 ✅ Patent 8,598,049 granted on 2013-12-03Deposition method
#18 | 2011-04-28 ✅ Patent 8,546,265 granted on 2013-10-01Method, apparatus and program for manufacturing silicon structure
#19 | 2011-01-13 ✅ Patent 8,771,461 granted on 2014-07-08Plasma processing apparatus
#20 | 2010-02-25 ✅ Patent 8,852,388 granted on 2014-10-07Plasma processor
#21 | 2009-11-12 ✅ Patent 8,518,283 granted on 2013-08-27Plasma etching method capable of detecting end point and plasma etching device therefor
Also check out SPP TECHNOLOGIES CO., LTD.'s (Tokyo, Japan) applicant profile with 7 patent applications submitted.
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