Eindhoven,
Netherlands
13
2025-02-20
The entities that hold a legal rights for patent applications filed by inventor LABETSKI Dzmitry:
Dzmitry LABETSKI from Eindhoven,, NL has applied for patents for these inventions. The list has both pending applications and granted patents:
A SYSTEM FOR USE IN A LITHOGRAPHIC APPARATUS
#2 | 2024-03-28APPARATUS FOR AND METHOD OF REDUCING CONTAMINATION FROM SOURCE MATERIAL IN AN EUV LIGHT SOURCE
#3 | 2024-03-14GUIDING DEVICE AND ASSOCIATED SYSTEM
#4 | 2021-10-21Apparatus for and method of reducing contamination from source material in an EUV light source
#5 | 2021-05-13Guiding device and associated system
#6 | 2020-03-19Guiding device and associated system
#7 | 2016-07-21Radiation source, lithographic apparatus device manufacturing method, sensor system and sensing method
#8 | 2015-03-19Module and method for producing extreme ultraviolet radiation
#9 | 2012-06-14Lithographic apparatus and device manufacturing method
#10 | 2011-10-27Method and system for determining a suppression factor of a suppression system and a lithographic apparatus
#11 | 2011-02-03RADIATION SYSTEM AND METHOD, AND A SPECTRAL PURITY FILTER
#12 | 2009-04-09Module and method for producing extreme ultraviolet radiation
#13 | 2009-03-19Lithographic apparatus and device manufacturing method
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