Encinitas, California
United States
28
2025-10-09
The entities that hold a legal rights for patent applications filed by inventor Rafac Robert Jay:
Robert Jay Rafac from Encinitas, US has applied for patents for these inventions. The list has both pending applications and granted patents:
LASER SYSTEM FOR SOURCE MATERIAL CONDITIONING IN AN EUV LIGHT SOURCE
#2 | 2024-12-19LASER SYSTEM FOR TARGET METROLOGY AND ALTERATION IN AN EUV LIGHT SOURCE
#3 | 2023-09-21EUV light source target metrology
#4 | 2023-05-25APPARATUS FOR AND METHOD OF ACCELERATING DROPLETS IN A DROPLET GENERATOR FOR AN EUV SOURCE
#5 | 2022-06-16LASER SYSTEM FOR SOURCE MATERIAL CONDITIONING IN AN EUV LIGHT SOURCE
#6 | 2022-05-12System for monitoring a plasma
#7 | 2022-03-17Determining moving properties of a target in an extreme ultraviolet light source
#8 | 2021-08-26Laser system for target metrology and alteration in an EUV light source
#9 | 2020-10-29System for monitoring a plasma
#10 | 2020-08-13Target expansion rate control in an extreme ultraviolet light source
#11 | 2019-09-05Reducing the effect of plasma on an object in an extreme ultraviolet light source
#12 | 2019-08-15Target expansion rate control in an extreme ultraviolet light source
#13 | 2018-11-29Reducing the effect of plasma on an object in an extreme ultraviolet light source
#14 | 2018-05-17Target expansion rate control in an extreme ultraviolet light source
#15 | 2018-05-17Compensating for a physical effect in an optical system
#16 | 2018-03-22Wavelength-based optical filtering
#17 | 2017-11-28EUV LPP source with dose control and laser stabilization using variable width laser pulses
#18 | 2017-05-04Polarization control of pulsed light beam
#19 | 2017-02-16Systems and methods for controlling EUV energy generation using pulse intensity
#20 | 2017-02-16Systems and methods for stabilization of droplet-plasma interaction via laser energy modulation
#21 | 2017-02-16Stabilizing EUV light power in an extreme ultraviolet light source
#22 | 2017-02-16Target expansion rate control in an extreme ultraviolet light source
#23 | 2016-08-23System and method for controlling source laser firing in an LPP EUV light source
#24 | 2016-06-30Extreme ultraviolet light source
#25 | 2016-01-28Target for extreme ultraviolet light source
#26 | 2014-09-18Extreme ultraviolet light source
#27 | 2014-03-25Extreme ultraviolet light source
#28 | 2014-01-07Controlling spatial properties in an excimer ring amplifier
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