Dresden
Germany
11
2017-08-17
The entities that hold a legal rights for patent applications filed by inventor Meyer Moritz Andreas:
Moritz Andreas Meyer from Dresden, DE has applied for patents for these inventions. The list has both pending applications and granted patents:
Metal line layout based on line shifting
#2 | 2016-03-08Method comprising applying an external mechanical stress to a semiconductor structure and semiconductor processing tool
#3 | 2012-04-12Technique for forming metal lines in a semiconductor by adapting the temperature dependence of the line resistance
#4 | 2011-05-26Method of forming an alloy in an interconnect structure to increase electromigration resistance
#5 | 2009-08-06INCREASING ELECTROMIGRATION RESISTANCE IN AN INTERCONNECT STRUCTURE OF A SEMICONDUCTOR DEVICE BY FORMING AN ALLOY
#6 | 2008-10-30Technique for forming metal lines in a semiconductor by adapting the temperature dependence of the line resistance
#7 | 2008-07-03Method of testing an integrity of a material layer in a semiconductor structure
#8 | 2007-08-30System and method for estimating the crystallinity of stacked metal lines in microstructures
#9 | 2006-10-05Technique for CD measurement on the basis of area fraction determination
#10 | 2005-07-28Technique for forming embedded metal lines having increased resistance against stress-induced material transport
#11 | 2005-04-07Technique for monitoring the state of metal lines in microstructures
1960822 ⎘