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Inventor profile of:

Jeffrey Robert Stack

City:

Clayton, Delaware

Country:

United States

Published Applications:

Last publication date:

2020-12-03

Top Assignees for applications by Jeffrey Robert Stack

The entities that hold a legal rights for patent applications filed by inventor Stack Jeffrey Robert:

Rohm and Haas Electronic Materials CMP Holdings 3 Newark, DE United States
Rohm and Haas Electronic Materials CMP Holdings, Inc. 2 Newark, DE United States
Rohm and Haas Electronic Materials CMP Holdings, I 1 Newark, DE United States

Recent patent applications by Stack Jeffrey Robert

Jeffrey Robert Stack from Clayton, US has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2020-12-03

US20200381258A1

Electricity

BIASED PULSE CMP GROOVE PATTERN

#2 | 2019-12-19

US20190381575A1

Performing operations; transporting

GELLING REDUCTION TOOL FOR GROOVING CHEMICAL MECHANICAL PLANARIZATION POLISHING PADS

#3 | 2018-12-20

US20180366333A1

Electricity

Biased pulse CMP groove pattern

#4 | 2018-12-20

US20180366332A1

Electricity

Controlled residence CMP polishing method

#5 | 2018-12-20

US20180366331A1

Electricity

Uniform CMP polishing method

#6 | 2018-12-20

US20180361533A1

Performing operations; transporting

Trapezoidal CMP groove pattern

#7 | 2018-12-20

US20180361532A1

Performing operations; transporting

High-rate CMP polishing method

#8 | 2018-10-04

US20180281076A1

Performing operations; transporting

GELLING REDUCTION TOOL FOR GROOVING CHEMICAL MECHANICAL PLANARIZATION POLISHING PADS

#9 | 2018-06-21

US20180169827A1

Performing operations; transporting

METHODS FOR MAKING CHEMICAL MECHANICAL PLANARIZATION (CMP) POLISHING PADS HAVING INTEGRAL WINDOWS

#10 | 2018-03-29

US20180085891A1

Performing operations; transporting

APPARATUS FOR SHAPING THE SURFACE OF CHEMICAL MECHANICAL POLISHING PADS

#11 | 2018-03-29

US20180085888A1

Performing operations; transporting

CHEMICAL MECHANICAL POLISHING PADS HAVING A CONSISTENT PAD SURFACE MICROTEXTURE

#12 | 2017-10-31

US15279645

Performing operations; transporting

Method to shape the surface of chemical mechanical polishing pads

InventorID:

2150171 ⎘