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Inventor profile of:

Edwin Te Sligte

City:

Eindhoven

Country:

Netherlands

Published Applications:

8

Last publication date:

2017-07-27

Top Assignees for applications by Edwin Te Sligte

The entities that hold a legal rights for patent applications filed by inventor Te Sligte Edwin:

ASML Netherlands B.V. 6 Veldhoven, Netherlands
Carl Zeiss SMT GmbH 4 Oberkochen, Germany
Nederlandse Organisatie voor toegepast- natuurwetenschappelijk Onderzoek TNO 1 Delft, Netherlands
Vision Dynamics Holding B.V. 1 Eindhoven, Netherlands

Recent patent applications by Te Sligte Edwin

Edwin Te Sligte from Eindhoven, NL has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2017-07-27

US20170212433A1

EUV lithography system and operating method

#2 | 2017-02-16

US20170045832A1

Cleaning Apparatus and Associated Low Pressure Chamber Apparatus

#3 | 2016-06-30

US20160187543A1

Optical element and optical system for EUV lithography, and method for treating such an optical element

#4 | 2013-08-15

US20130206720A1

Device and method for generating a plasma discharge for patterning the surface of a substrate

#5 | 2013-07-25

US20130186430A1

Performing operations; transporting

Method for removing a contamination layer from an optical surface and arrangement therefor

#6 | 2013-05-23

US20130126226A1

METHOD OF MAKING A SUPPORT STRUCTURE

#7 | 2012-01-12

US20120006258A1

HYDROGEN RADICAL GENERATOR

#8 | 2010-11-18

US20100288302A1

Performing operations; transporting

Method for removing a contamination layer from an optical surface and arrangement therefor as well as a method for generating a cleaning gas and arrangement therefor

InventorID:

254937 ⎘