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Inventor profile of:

Erik Loopstra

City:

Huernheim

Country:

Germany

Published Applications:

6

Last publication date:

2024-01-25

Top Assignees for applications by Erik Loopstra

The entities that hold a legal rights for patent applications filed by inventor Loopstra Erik:

Carl Zeiss SMT GmbH 2 Oberkochen, Germany

Recent patent applications by Loopstra Erik

Erik Loopstra from Huernheim, DE has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2024-01-25

US20240027730A1

METHOD FOR PRODUCING A MIRROR OF A LITHOGRAPHY SYSTEM

#2 | 2024-01-18

US20240019613A1

METHOD FOR PRODUCING A MIRROR OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS

#3 | 2023-11-23

US20230375939A1

METHOD FOR PRODUCING A MULTI-PART MIRROR OF A PROJECTION ILLUMINATION SYSTEM FOR MICROLITHOGRAPHY

#4 | 2021-05-20

US20210149309A1

POSITION MEASUREMENT OF OPTICAL ELEMENTS IN A LITHOGRAPHIC APPARATUS

#5 | 2020-03-19

US20200089126A1

Position measurement of optical elements in a lithographic apparatus

#6 | 2019-07-18

US20190219926A1

Projection exposure apparatus, and method for reducing deformations, resulting from dynamic accelerations, of components of the projection exposure apparatus

InventorID:

2562299 ⎘