Oberkochen
Germany
10
2013-07-25
The entities that hold a legal rights for patent applications filed by inventor Stein Thomas:
Thomas Stein from Oberkochen, DE has applied for patents for these inventions. The list has both pending applications and granted patents:
Method for removing a contamination layer from an optical surface and arrangement therefor
#2 | 2013-06-13Optical arrangement, in particular projection exposure apparatus for EUV lithography, as well as reflective optical element with reduced contamination
#3 | 2010-11-18Method for removing a contamination layer from an optical surface and arrangement therefor as well as a method for generating a cleaning gas and arrangement therefor
#4 | 2010-02-11Method for cleaning an EUV lithography device, method for measuring the residual gas atmosphere and the contamination and EUV lithography device
#5 | 2009-09-17Optical arrangement, in particular projection exposure apparatus for EUV lithography, as well as reflective optical element with reduced contamination
#6 | 2009-07-09Lithographic apparatus, and device manufacturing method
#7 | 2008-06-19Optical arrangement and EUV lithography device with at least one heated optical element, operating methods, and methods for cleaning as well as for providing an optical element
#8 | 2008-04-10Lithographic apparatus, and device manufacturing method
#9 | 2008-04-10Cleaning method, apparatus and cleaning system
#10 | 2007-06-21Apparatus and method for the detection of a surface reaction, especially for cleaning of an arbitrary two-dimensional surface or three-dimensional body
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