Brian K. Hatcher

City:

Country:

United States

Published Applications:

Last publication date:

2009-06-18

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Brian K. Hatcher from , US has applied for patents for these inventions. The list has both pending applications and granted patents:

Method of controlling CD bias and CD microloading by changing the ceiling-to-wafer gap in a plasma reactor

Gate profile control through effective frequency of dual HF/VHF sources in a plasma etch process

Method of processing a workpiece using a mid-chamber gas distribution plate, tuned plasma flow control grid and electrode

Mid-chamber gas distribution plate, tuned plasma flow control grid and electrode

Plasma etch process for controlling line edge roughness

InventorID:

3960061 ⎘