Berkeley, California
United States
32
2018-03-08
The entities that hold a legal rights for patent applications filed by inventor Valcore, JR. John C.:
John C. Valcore, JR. from Berkeley, US has applied for patents for these inventions. The list has both pending applications and granted patents:
Using modeling to determine ion energy associated with a plasma system
#2 | 2017-06-22Impedance-based adjustment of power and frequency
#3 | 2017-05-25Cable power loss determination for virtual metrology
#4 | 2016-12-01Arrangement for plasma processing system control based on RF voltage
#5 | 2016-04-28System, method and apparatus for RF power compensation in a plasma processing system
#6 | 2016-04-28System, method and apparatus for refining radio frequency transmission system models
#7 | 2016-04-21System, method and apparatus for improving accuracy of RF transmission models for selected portions of an RF transmission path
#8 | 2016-03-03System, method and apparatus for using optical data to monitor RF generator operations
#9 | 2016-01-07Impedance-based adjustment of power and frequency
#10 | 2015-11-19Arrangement for plasma processing system control based on RF voltage
#11 | 2015-10-29Methods and apparatus for controlling plasma in a plasma processing system
#12 | 2015-10-22Using modeling for identifying a location of a fault in an RF transmission system for a plasma system
#13 | 2015-07-16Cable power loss determination for virtual metrology
#14 | 2015-03-12RF impedance model based fault detection
#15 | 2015-02-19Sub-pulsing during a state
#16 | 2015-01-29Etch rate modeling and use thereof with multiple parameters for in-chamber and chamber-to-chamber matching
#17 | 2015-01-29Etch rate modeling and use thereof for in-chamber and chamber-to-chamber matching
#18 | 2014-10-16Soft pulsing
#19 | 2014-09-18Dual control modes
#20 | 2014-07-31Segmenting a model within a plasma system
#21 | 2014-07-31Using modeling to determine ion energy associated with a plasma system
#22 | 2014-07-31Using modeling to determine wafer bias associated with a plasma system
#23 | 2014-07-31Determining a malfunctioning device in a plasma system
#24 | 2014-07-17Tuning a parameter associated with plasma impedance
#25 | 2014-07-10Control of etch rate using modeling, feedback and impedance match
#26 | 2014-06-19Optimizing a rate of transfer of data between an RF generator and a host system within a plasma tool
#27 | 2014-06-19Determining a value of a variable on an RF transmission model
#28 | 2014-06-19Computation of statistics for statistical data decimation
#29 | 2014-03-20Edge ramping
#30 | 2014-01-09Adjustment of power and frequency based on three or more states
#31 | 2013-08-22Impedance-based adjustment of power and frequency
#32 | 2013-08-22State-based adjustment of power and frequency
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