Inventor profile of:

Prabhat Kumar

City:

Framingham, Massachusetts

Country:

United States

Published Applications:

38

Last publication date:

2016-06-30

Top Assignees for applications by Prabhat Kumar

The entities that hold a legal rights for patent applications filed by inventor Kumar Prabhat:

Recent patent applications by Kumar Prabhat

Prabhat Kumar from Framingham, US has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2016-06-30
US20160186311A1
Chemistry; metallurgy

Methods of forming molybdenum sputtering targets

#2 | 2015-12-24
US20150368754A1
Chemistry; metallurgy

Niobium based alloy that is resistant to aqueous corrosion

#3 | 2015-05-21
US20150136584A1
Chemistry; metallurgy

Methods of depositing thin films using molybdenum sputtering targets

#4 | 2015-02-05
US20150034477A1
Chemistry; metallurgy

Fine grained, non banded, refractory metal sputtering targets with a uniformly random crystallographic orientation, method for making such film, and thin film based devices and products made therefrom

#5 | 2014-10-09
US20140299466A1
Chemistry; metallurgy

HIGH-DENSITY METALLIC SPUTTERING TARGETS

#6 | 2013-12-19
US20130337159A1
Chemistry; metallurgy

Methods of rejuvenating sputtering targets

#7 | 2013-08-29
US20130224059A1
Chemistry; metallurgy

Methods of forming molybdenum sputtering targets

#8 | 2012-10-04
US20120251714A1
Chemistry; metallurgy

Methods of rejuvenating sputtering targets

#9 | 2012-07-26
US20120189483A1
Chemistry; metallurgy

Methods of forming molybdenum sputtering targets

#10 | 2011-12-15
US20110303535A1
Chemistry; metallurgy

SPUTTERING TARGETS AND METHODS OF FORMING THE SAME

#11 | 2011-04-28
US20110097236A1
Chemistry; metallurgy

Methods of making molybdenum titanium sputtering plates and targets

#12 | 2011-02-24
US20110041650A1
Chemistry; metallurgy

Niobium based alloy that is resistant to aqueous corrosion

#13 | 2011-01-13
US20110008201A1
Chemistry; metallurgy

NIOBIUM BASED ALLOY THAT IS RESISTANT TO AQUEOUS CORROSION

#14 | 2010-04-08
US20100086800A1
Performing operations; transporting

Low-energy method of manufacturing bulk metallic structures with submicron grain sizes

#15 | 2009-07-23
US20090186230A1
Chemistry; metallurgy

REFRACTORY METAL-DOPED SPUTTERING TARGETS, THIN FILMS PREPARED THEREWITH AND ELECTRONIC DEVICE ELEMENTS CONTAINING SUCH FILMS

#16 | 2009-03-12
US20090065747A1
Chemistry; metallurgy

Tin oxide-based sputtering target, transparent and conductive films, method for producing such films and composition for use therein

#17 | 2008-12-25
US20080314737A1
Chemistry; metallurgy

Methods of Making Molybdenium Titanium Sputtering Plates and Targets

#18 | 2008-11-06
US20080271779A1
Chemistry; metallurgy

Methods of forming sputtering targets

#19 | 2008-09-11
US20080216602A1
Electricity

Low-energy method for fabrication of large-area sputtering targets

#20 | 2008-08-14
US20080193798A1
Chemistry; metallurgy

Molybdenum tubular sputtering targets with uniform grain size and texture

#21 | 2008-07-24
US20080176005A1
Chemistry; metallurgy

Pre-plating surface treatments for enhanced galvanic-corrosion resistance

#22 | 2008-07-17
US20080171215A1
Chemistry; metallurgy

High density refractory metals and alloys sputtering targets

#23 | 2008-05-01
US20080102304A1
Electricity

Refractory Metal Substrate with Improved Thermal Conductivity

#24 | 2008-05-01
US20080099731A1
Chemistry; metallurgy

Tin oxide-based sputtering target, low resistivity, transparent conductive film, method for producing such film and composition for use therein

#25 | 2008-04-17
US20080087866A1
Electricity

Titanium oxide-based sputtering target for transparent conductive film, method for producing such film and composition for use therein

#26 | 2007-12-06
US20070280848A1
Chemistry; metallurgy

Methods Of Forming Alpha And Beta Tantalum Films With Controlled And New Microstructures

#27 | 2007-04-26
US20070089984A1
Chemistry; metallurgy

Methods of making molybdenum titanium sputtering plates and targets

#28 | 2007-03-29
US20070071985A1
Chemistry; metallurgy

Sputtering target, low resistivity, transparent conductive film, method for producing such film and composition for use therein

#29 | 2006-10-19
US20060234055A1
Chemistry; metallurgy

Pre-plating surface treatments for enhanced galvanic-corrosion resistance

#30 | 2006-07-27
US20060165572A1
Chemistry; metallurgy

Method of making MoOpowders, products made from MoOpowders, deposition of MoOthin films, and methods of using such materials

#31 | 2006-07-27
US20060162822A1
Chemistry; metallurgy

Capacitor-grade lead wires with increased tensile strength and hardness

#32 | 2006-07-13
US20060151072A1
Chemistry; metallurgy

Molybdenum alloy x-ray targets having uniform grain structure

#33 | 2006-05-04
US20060091552A1
Electricity

Refractory metal substrate with improved thermal conductivity

#34 | 2006-03-02
US20060042728A1
Chemistry; metallurgy

Molybdenum sputtering targets

#35 | 2006-02-16
US20060032735A1
Electricity

Rejuvenation of refractory metal products

#36 | 2005-06-30
US20050142021A1
Performing operations; transporting

Refractory metal and alloy refining by laser forming and melting

#37 | 2005-06-28
US10801324
-

Thin film capacitor using conductive polymers

#38 | 2005-02-10
US20050031481A1
Electricity

Capacitor-grade lead wires with increased tensile strength and hardness

InventorID:

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