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Inventor profile of:

Mathieu Kipp

City:

Duttlenheim

Country:

Germany

Published Applications:

1

Last publication date:

2007-01-04

Recent patent applications by Kipp Mathieu

Mathieu Kipp from Duttlenheim, DE has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2007-01-04

US20070003839A1

Performing operations; transporting

$M(c)method for producing inclined flank patterns by photolithography

InventorID:

4328314 ⎘