Michael Arnz

Projection exposure apparatus with wavefront measuring device and optical wavefront manipulator

Method for determining the registration of a structure on a photomask and apparatus to perform the method

Method and device for determining a lateral offset of a pattern on a substrate relative to a desired position

Test object for measuring the point spread function of an optical system

Measuring device for measuring an illumination property

Grating-assisted autofocus device and autofocusing method for an imaging device

Method and apparatus for the position determination of structures on a mask for microlithography

Method and device for determining the position of a first structure relative to a second structure or a part thereof

Determination of the relative position of two structures

Method for determining the registration of a structure on a photomask and apparatus to perform the method

Method and device for measuring the relative local position error of one of the sections of an object that is exposed section by section

Autofocus device and autofocusing method for an imaging device

Method and device for determining the position of an edge of a marker structure with subpixel accuracy in an image, having a plurality of pixels, of the marker structure

Method for calibrating a specimen stage of a metrology system and metrology system comprising a specimen stage

Method and apparatus for determining the relative overlay shift of stacked layers

Method and apparatus for measuring scattered light on an optical system

APPARATUS AND METHOD FOR MEASURING THE POSITIONS OF MARKS ON A MASK

Method and apparatus for determining the position of a structure on a carrier relative to a reference point of the carrier

Device and method for range-resolved determination of scattered light, and an illumination mask

Device for the range-resolved determination of scattered light, operating method, illumination mask and image-field mask