Eisuke Tokumitsu

City:

Ishikawa

Country:

Japan

Published Applications:

Last publication date:

2016-09-29

Top Assignees for applications by Eisuke Tokumitsu

The entities that hold a legal rights for patent applications filed by inventor Tokumitsu Eisuke:

Japan Science and Technology Agency 2 Saitama, Japan

Recent patent applications by Tokumitsu Eisuke

Eisuke Tokumitsu from Ishikawa, JP has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2016-09-29

US20160284790A1

Electricity

Dielectric layer and manufacturing method of dielectric layer, and solid-state electronic device and manufacturing method of solid-state electronic device

#2 | 2016-01-21

US20160016813A1

Chemistry; metallurgy

OXIDE LAYER AND PRODUCTION METHOD FOR OXIDE LAYER, AS WELL AS CAPACITOR, SEMICONDUCTOR DEVICE, AND MICROELECTROMECHANICAL SYSTEM PROVIDED WITH OXIDE LAYER

#3 | 2014-10-30

US20140319660A1

Electricity

Solid-state electronic device including dielectric bismuth niobate film formed from solution

InventorID:

950225 ⎘