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Patent application title:

Method for flawless application of nail polish

Publication number:

US20060207624A1

Publication date:
Application number:

10/907,078

Filed date:

2005-03-18

Abstract:

This method for flawless application of nail polish is a simple four step processing involving the use of a water soluble facial masque, nail primer (if necessary) and running water.

Inventors:

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Classification:

  1. Human necessities
  2. Hand or travelling articles

A45D29/004 »  CPC main

Manicuring or pedicuring implements Masking devices for applying polish to the finger nails

A45D7/00 IPC

Processes of waving, straightening or curling hair

Description

FIELD OF THE INVENTION

Well groomed finger nails are highly valued and enhance a person's overall appearance. Nail polish and home manicure products make up a significant portion of the $29 Billion dollar cosmetic industry.

BACKGROUND OF THE INVENTION

The self application of nail polish is very difficult. The majority of the population is single-handed (either left or right) making the application of polish to the nails on the favored hand especially difficult. Salon nail care can be expensive and inconvenient, especially for busy working women and mothers. This invention is designed to provide a home nail care alternative which is less expensive, can be done any time of the day or night, and results in equal or better quality results.

STATMENT OF THE INVENTION

This invention is a method for flawless application of nail polish comprising the application of a facial masque to the skin surrounding the nail followed by the application of a nail primer to remove excess masque from the nail surface (if necessary). The facial mask dries to form a physical barrier which prevents excess nail polish from contacting the skin around the nail during application. The facial masque is subsequently washed away under running water leaving flawlessly applied nail polish.

BRIEF DESCRIPTION OF DRAWINGS

FIG. 1 depicts the application of the masque material to the cuticle and skin surrounding the nail

FIG. 2 depicts the application of the nail primer to remove excess masque material from the nail surface (if necessary)

FIG. 3 depicts the nail after application of the nail polish showing excess polish on the masque material

FIG. 4 depicts the nail being rinsed to remove the facial masque material

FIG. 5 depicts the final perfectly polished nail

Claims

What is claimed is:

1. A method for the flawless application of nail polish comprising the steps of:

a) applying a facial masque material on the skin around the nail;

b) applying a nail primer to the surface of the nail to remove excess masque material (if required);

c) applying the nail polish;

d) washing away the facial masque, leaving a flawlessly polished nail.

2. The method according to claim 1 wherein the facial masque is water soluble and sets with a dry surface which is unaffected by contact with nail polish.

3. The method according to claim 1 wherein the facial masque may contain a moisturizing agent for the added benefit of improved nail and cuticle health.

4. The method according to claim 1 wherein the nail primer is a generally available alcohol-based product (typically used prior to the application of artificial nails) for the added benefit of reduced incidence of fungal and bacterial infection.

Resources

Images & Drawings included:

Fig. 01 - Method for flawless application of nail polish
Fig. 01
Fig. 02 - Method for flawless application of nail polish
Fig. 02
Fig. 03 - Method for flawless application of nail polish
Fig. 03
Fig. 04 - Method for flawless application of nail polish
Fig. 04

Sources:

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