Explore the 7,243 U.S. Patent Applications published on the 03rd week of 2015, including 5,000 applications that subsequently received a Patent Grant.
Planar waveguide apparatus with diffraction element(s) and system employing same
A waveguide apparatus includes a planar waveguide and at least one optical diffraction element (DOE) that provides a plurality of optical paths between an exterior and interior of the planar waveguide. A phase profile of the DOE may combine a linear diffraction grating with a circular lens, to shape a wave front and produce beams with desired focus. Waveguide apparati may be assembled to create multiple focal planes. The DOE may have a low diffraction efficiency, and planar waveguides may be transparent when viewed normally, allowing passage of light from an ambient environment (e.g., real world) useful in AR systems. Light may be returned for temporally sequentially passes through the planar waveguide. The DOE(s) may be fixed or may have dynamically adjustable characteristics. An optical coupler system may couple images to the waveguide apparatus from a projector, for instance a biaxially scanning cantilevered optical fiber tip.
Published: 2015-01-15 Assignee: Hyundai Motor Company.Hydraulic circuit for automatic transmission
A hydraulic circuit may include a proportional control solenoid valve controlling hydraulic pressure such that an operating hydraulic pressure required by the friction member is supplied to the friction member; a supply hydraulic path connecting the proportional control solenoid valve with the friction member, and adapted to supply hydraulic pressure controlled by the proportional control solenoid valve to the friction member; and a switch valve disposed in the supply hydraulic path so as to selectively open/close the supply hydraulic path.
Published: 2015-01-15 Assignee: Covidien LP.
Methods and devices for performing a surgical anastomosis
A circular stapler is disclosed. The circular stapler comprises a handle assembly, an elongate body, and a cartridge assembly. The elongate body extends from the handle assembly and defines a longitudinal axis. The cartridge assembly is disposed adjacent a distal end of the elongate body. The cartridge assembly includes a pusher assembly and a knife assembly. The pusher assembly is movable to cause staples to be ejected from the cartridge assembly. The knife assembly is selectively movable relative to the pusher assembly to distally translate a knife. A knife carrier of the knife assembly includes at least one latch thereon. The at least one latch is configured to contact an engagement surface of the pusher assembly in response to movement between the knife carrier and the pusher assembly. The at least one latch is prevented from distally translating beyond the engagement surface.
Published: 2015-01-15 Assignee: AMAZON TECHNOLOGIES, INC..
Detecting item interaction and movement
This disclosure describes a system for tracking removal or placement of items at inventory locations with a materials handling facility. In some instances, a user may remove an item from an inventory location and the inventory management system may detect that removal and update a user item list associated with the user to include an item identifier representative of the removed item. Likewise, if the user places an item at an inventory location, the inventory management system may detect that placement and update the user item list to remove an item identifier representative of the placed item.
Published: 2015-01-15 Assignee: LAM RESEARCH CORPORATION.
Sequential precursor dosing in an ALD multi-station/batch reactor
Disclosed herein are methods of depositing layers of material on multiple semiconductor substrates at multiple processing stations within one or more reaction chambers. The methods may include dosing a first substrate with film precursor at a first processing station and dosing a second substrate with film precursor at a second processing station with precursor flowing from a common source, wherein the timing of said dosing is staggered such that the first substrate is dosed during a first dosing phase during which the second substrate is not substantially dosed, and the second substrate is dosed during a second dosing phase during which the first substrate is not substantially dosed. Also disclosed herein are apparatuses having a plurality of processing stations contained within one or more reaction chambers and a controller with machine-readable instructions for staggering the dosing of first and second substrates at first and second processing stations.
Published: 2015-01-15 Assignee: MASIMO CORPORATION.Physiological monitor
A patient monitor has multiple sensors adapted to attach to tissue sites of a living subject. The sensors generate sensor signals that are responsive to at least two wavelengths of optical radiation after attenuation by pulsatile blood within the tissue sites.
Published: 2015-01-15
Advanced heterojunction devices and methods of manufacturing advanced heterojunction devices
Methods of manufacture of advanced electronic and photonic structures including heterojunction transistors, transistor lasers and solar cells and their related structures, are described herein. Other embodiments are also disclosed herein.
Published: 2015-01-15 Assignee: ASM IP Holding B.V..
Method and system to reduce outgassing in a reaction chamber
Systems and methods of reducing outgassing of a substance within a reaction chamber of a reactor are disclosed. Exemplary methods include depositing a barrier layer within the reaction chamber and using a scavenging precursor to react with species on a surface of the reaction chamber. Exemplary systems include gas-phase deposition systems, such as atomic layer deposition systems, which include a barrier layer source and/or a scavenging precursor source fluidly coupled to a reaction chamber of the system.
Published: 2015-01-15 Assignee: ASM International N.V., ASM International N.V..
Methods for forming doped silicon oxide thin films
The present disclosure relates to the deposition of dopant films, such as doped silicon oxide films, by atomic layer deposition processes. In some embodiments, a substrate in a reaction space is contacted with pulses of a silicon precursor and a dopant precursor, such that the silicon precursor and dopant precursor adsorb on the substrate surface. Oxygen plasma is used to convert the adsorbed silicon precursor and dopant precursor to doped silicon oxide.
Published: 2015-01-15 Assignee: DTS, INC..
Spatial calibration of surround sound systems including listener position estimation
A method for calibrating a surround sound system is disclosed. The method utilizes a microphone array integrated in a front center loudspeaker of the surround sound system or a soundbar facing a listener. Positions of each loudspeaker relative to the microphone array can be estimated by playing a test signal at each loudspeaker and measuring the test signal received at the microphone array. The listener's position can also be estimated by receiving the listener's voice or other sound cues made by the listener using the microphone array. Once the positions of the loudspeakers and the listener's position are estimated, spatial calibrations can be performed for each loudspeaker in the surround sound system so that listening experience is optimized.