Patent Applications published on Jun 2, 2016

Explore the 6,693 U.S. Patent Applications published on the 22nd week of 2016, including 4,987 applications that subsequently received a Patent Grant.

Featured patent applications from Jun 2, 2016

Published: 2016-06-02 Assignee: REX MEDICAL, L.P..
US20160151065A1
Human necessities
Application 20160151065, fig. 01

Apparatus and method for resectioning gastro-esophageal tissue

A system for stapling tissue comprises a flexible endoscope and an operative head including a pair of opposed, curved tissue clamping jaws sized to pass through an esophagus, the jaws being moveable with respect to one another between an open tissue receiving configuration and a closed tissue clamping configuration, a first one of the curved jaws including a stapling mechanism and a second one of the jaws including a staple forming anvil surface, the stapling mechanism including staple slots through which staples are fired arranged in a row extending from a proximal end of the first jaw to a distal end thereof in combination with a control handle which, when the operative head is in an operative position within one of a patient's stomach and esophagus, remains outside the patient, the control handle including a first actuator for moving the jaws relative to one another and a second actuator for operating the stapling mechanism.

Published: 2016-06-02 Assignee: Johnson Controls Technology Company.
US20160156299A1
Electricity
Application 20160156299, fig. 01

HVAC actuator with automatic end stop recalibration

An actuator in a HVAC system includes a motor and a drive device driven by the motor. The drive device is coupled to a movable HVAC component for driving the movable HVAC component between multiple positions. The actuator further includes a main actuator controller. The main actuator controller includes end stop location memory that stores one or more end stop locations indicating expected locations of the one or more end stops. The main actuator controller further includes an end stop location recalibrator that runs an automatic recalibration process to determine and set recalibrated end stop locations. The end stop location recalibrator runs the automatic calibration process in response to detecting that the drive device has unexpectedly stalled at a location other than a stored end stop location.

Published: 2016-06-02 Assignee: Microsoft Technology Licensing, LLC.
US20160155443A1
Physics
Application 20160155443, fig. 01

Device arbitration for listening devices

An electronic device in a topology of interconnected electronic devices can listen for a wake phrase and voice commands. The device can control when and how it responds so that a single device responds to voice commands. Per-task device preferences can be stored for a user. If a preferred device is not available, the task can still be performed on a device that has appropriate capabilities. Machine learning can determine a user's preferences. Power conservation and effective user interaction can result.

Published: 2016-06-02 Assignee: Microsoft Technology Licensing, LLC.
US20160155442A1
Physics
Application 20160155442, fig. 01

Extending digital personal assistant action providers

An electronic device can receive user input via voice or text that includes tasks to be performed. A digital personal assistant infrastructure service can control to which registered action provider the task is assigned. Per-task action provider preferences can be stored. If a preferred action provider is not able to complete the task, the task can still be performed by a registered action provider that has appropriate capabilities. Machine learning can determine a user's preferences. Resource conservation and effective user interaction can result.

Published: 2016-06-02 Assignee: ULTRATECH, INC..
US20160155629A1
Electricity
Application 20160155629, fig. 01

Formation of heteroepitaxial layers with rapid thermal processing to remove lattice dislocations

Method and devices are disclosed for device manufacture of gallium nitride devices by growing a gallium nitride layer on a silicon substrate using Atomic Layer Deposition (ALD) followed by rapid thermal annealing. Gallium nitride is grown directly on silicon or on a barrier layer of aluminum nitride grown on the silicon substrate. One or both layers are thermally processed by rapid thermal annealing. Preferably the ALD process use a reaction temperature below 550° C. and preferable below 350° C. The rapid thermal annealing step raises the temperature of the coating surface to a temperature ranging from 550 to 1500° C. for less than 12 msec.

Published: 2016-06-02 Assignee: Novellus Systems, Inc..
US20160155676A1
Electricity
Application 20160155676, fig. 01

Methods for depositing films on sensitive substrates

Methods and apparatus to form films on sensitive substrates while preventing damage to the sensitive substrate are provided herein. In certain embodiments, methods involve forming a bilayer film on a sensitive substrate that both protects the underlying substrate from damage and possesses desired electrical properties. Also provided are methods and apparatus for evaluating and optimizing the films, including methods to evaluate the amount of substrate damage resulting from a particular deposition process and methods to determine the minimum thickness of a protective layer. The methods and apparatus described herein may be used to deposit films on a variety of sensitive materials such as silicon, cobalt, germanium-antimony-tellerium, silicon-germanium, silicon nitride, silicon carbide, tungsten, titanium, tantalum, chromium, nickel, palladium, ruthenium, or silicon oxide.

Published: 2016-06-02 Assignee: President and Fellows of Harvard College, MASSACHUSETTS INSTITUTE OF TECHNOLOGY, THE BROAD INSTITUTE, INC..
US20160153005A1
Chemistry; metallurgy
Application 20160153005, fig. 02

Delivery and use of the CRISPR-Cas systems, vectors and compositions for hepatic targeting and therapy

The invention provides for delivery, engineering and optimization of systems, methods, and compositions for manipulation of sequences and/or activities of target sequences. Provided are delivery systems and tissues or organ which are targeted as sites for delivery. Also provided are vectors and vector systems some of which encode one or more components of a CRISPR complex, as well as methods for the design and use of such vectors. Also provided are methods of directing CRISPR complex formation in eukaryotic cells to ensure enhanced specificity for target recognition and avoidance of toxicity and to edit or modify a target site in a genomic locus of interest to alter or improve the status of a disease or a condition.

Published: 2016-06-02 Assignee: ASM IP Holding B.V., ASM IP HOLDINGS B.V..
US20160153088A1
Chemistry; metallurgy
Application 20160153088, fig. 01

Film forming apparatus

A film forming apparatus includes a susceptor, and a shower head provided above the susceptor and having a first passage and a second passage independent of the first passage formed therein, wherein the first passage is formed through the shower head by being provided with a first cavity surrounded by a first upper wall and a first lower wall, a first thin hole formed in the first upper wall, and a plurality of second thin holes formed in the first lower wall, the height of the first upper wall in the vertical direction is reduced with increase in distance from the first thin hole, and the second passage is formed in the same manner as the first passage.

Published: 2016-06-02 Assignee: President and Fellows of Harvard College.
US20160152649A1
Chemistry; metallurgy
Application 20160152649, fig. 02

Metal amides of cyclic amines

Compounds, and oligomers of the compounds, are synthesized with cyclic amine ligands attached to a metal atom. These compounds are useful for the synthesis of materials containing metals. Examples include pure metals, metal alloys, metal oxides, metal nitrides, metal phosphides, metal sulfides, metal selenides, metal tellurides, metal borides, metal carbides, metal silicides and metal germanides. Techniques for materials synthesis include vapor deposition (chemical vapor deposition and atomic layer deposition), liquid solution methods (sol-gel and precipitation) and solid-state pyrolysis. Suitable applications include electrical interconnects in microelectronics and magnetoresistant layers in magnetic information storage devices. The films have very uniform thickness and high step coverage in narrow holes.

Published: 2016-06-02 Assignee: BEYOND TWENTY LTD..
US20160150824A1
Human necessities
Application 20160150824, fig. 01

E-cigarette personal vaporizer

An e-cigarette PV that includes an air pressure valve or device so that excess air can escape from an e-liquid reservoir in the PV when that reservoir is being filled under pressure with e-liquid from a parent reservoir. The valve or device is a barrier made of an air-porous material, such as a sintered polymer or metal, coated with or otherwise including a barrier or layer of an air-porous substance that is not porous to e-liquid, such as an oleophobic material or a hydrophobic or super-hydrophobic material. The oleophobic material is one of: sintered phosphor bronze, sintered stainless steel and sintered PU plastic.