Patent Applications published on Jan 14, 2021

Explore the 7,756 U.S. Patent Applications published on the 02nd week of 2021, including 6,075 applications that subsequently received a Patent Grant.

Featured patent applications from Jan 14, 2021

Published: 2021-01-14
US20210008413A1
Human necessities
Application 20210008413, fig. 01

Interactive Personal Training System

A system and method for tracking physical activity of a user performing exercise movements and providing feedback and recommendations relating to performing the exercise movements is disclosed. The method includes receiving a stream of sensor data in association with a user performing an exercise movement over a period of time, processing the stream of sensor data, detecting, using a first classifier on the processed stream of sensor data, one or more poses of the user performing the exercise movement, determining, using a second classifier on the one or more detected poses, a classification of the exercise movement and one or more repetitions of the exercise movement, determining, using a third classifier on the one or more detected poses and the one or more repetitions of the exercise movement, feedback including a score for the one or more repetitions, the score indicating an adherence to predefined conditions for correctly performing the exercise movement, and presenting the feedback in real-time in association with the user performing the exercise movement.

Published: 2021-01-14 Assignee: ASM IP Holding B.V..
US20210013037A1
Electricity
Application 20210013037, fig. 01

STRUCTURE INCLUDING A PHOTORESIST UNDERLAYER AND METHOD OF FORMING SAME

Methods of forming structures including a photoresist underlayer and structures including the photoresist underlayer are disclosed. Exemplary methods include forming the photoresist underlayer using one or more of plasma-enhanced cyclic (e.g., atomic layer) deposition and plasma-enhanced chemical vapor deposition. Surface properties of the photoresist underlayer can be manipulated using a treatment process.

Published: 2021-01-14 Assignee: LAM RESEARCH CORPORATION.
US20210013034A1
Electricity
Application 20210013034, fig. 01

METHODS FOR MAKING EUV PATTERNABLE HARD MASKS

Methods for making thin-films on semiconductor substrates, which may be patterned using EUV, include: mixing a vapor stream of an organometallic precursor with a vapor stream of a counter-reactant so as to form a polymerized organometallic material; and depositing the organometallic polymer-like material onto the surface of the semiconductor substrate. The mixing and depositing operations may be performed by chemical vapor deposition (CVD), atomic layer deposition (ALD), and ALD with a CVD component, such as a discontinuous, ALD-like process in which metal precursors and counter-reactants are separated in either time or space.

Published: 2021-01-14 Assignee: ASM IP Holding B.V..
US20210013085A1
Electricity
Application 20210013085, fig. 01

Substrate support assembly and substrate processing device including the same

A substrate support assembly arranged in a chamber includes: a support plate including a first surface on which a substrate is seated; a driver configured to tilt the support plate such that the first surface is inclined with respect to a reference surface by a lower inclination angle; and a controller configured to control the driver such that the lower inclination angle is adjusted based on an upper inclination angle formed by the inclination of the gas supplier coupled to the upper surface of the chamber with respect to the reference surface.

Published: 2021-01-14 Assignee: ASM IP Holding B.V..
US20210013042A1
Electricity
Application 20210013042, fig. 01

Methods for forming a metallic film on a substrate by cyclical deposition and related semiconductor device structures

Methods for forming a metallic film on a substrate by cyclical deposition are provided. In some embodiments methods may include contacting the substrate with a first reactant comprising a non-halogen containing metal precursor comprising at least one of copper, nickel or cobalt and contacting the substrate with a second reactant comprising a hydrocarbon substituted hydrazine. In some embodiments related semiconductor device structures may include at least a portion of a metallic interconnect formed by cyclical deposition processes.

Published: 2021-01-14 Assignee: ASM IP Holding B.V..
US20210013010A1
Electricity
Application 20210013010, fig. 01

Plasma device using coaxial waveguide, and substrate treatment method

Examples of a plasma device includes a coaxial waveguide having an inner conductor and an outer conductor enclosing the inner conductor with a first gap provided between the outer conductor and the inner conductor, the coaxial waveguide having a shape of branching at a plurality of branch parts, a plurality of rods having a conductor and a dielectric enclosing the conductor with a second gap provided between the dielectric and the conductor, the plurality of rods connecting two end parts of the coaxial waveguide branched at the branch parts, so as to connect the first gap and the second gap, and a conductive stub provided at a branched portion, obtained by branching at the branch parts, of the coaxial waveguide, the conductive stub being insertable to and removable from the first gap.

Published: 2021-01-14 Assignee: Snap Inc..
US20210011612A1
Physics
Application 20210011612, fig. 01

Edge gesture interface with smart interactions

Methods, systems, user interfaces, media, and devices provide a geographically-based graphical user interface (GUI) suited to single-handed operation of a device. The method and system provide for causing display of a GUI including map data displayed in a first view; receiving input comprising at least one input point; determining first and second characteristics of the input; processing; when the first characteristic fulfils a first operational mode criterion, the input according to a first operational mode and causing display of the map data in a second view, the second view being based on the second characteristic of the input; and processing, when the first characteristic of the input fulfils a second operational mode criterion, the input according to a second operational mode, and causing display of the map data in a third view, the third view being based on the second characteristic of the input.

Published: 2021-01-14
US20210007760A1
Human necessities
Application 20210007760, fig. 01

SURGICAL SYSTEMS WITH SESNSING AND MACHINE LEARNING CAPABILITIES AND METHODS THEREOF

Systems and methods for determining surgical system settings during a surgical procedure are disclosed. The surgical systems comprise of a control system, a means for tissue removal, sensing capabilities and machine learning application(s). The sensing capabilities and machine learning application(s) are configured to determine type and/or properties of the removed tissue and to predict preferred surgical settings for optimized removal and surgical outcomes. The learning machine application(s) communicates these preferred settings to a surgical control system.

Published: 2021-01-14 Assignee: Cilag GmbH International.
US20210007742A1
Human necessities
Application 20210007742, fig. 01

Method of using lockout features for surgical stapler cartridge

A surgical instrument comprises a body, shaft, and end effector. The shaft couples the end effector and body together. The end effector comprises an anvil and lower jaw configured to receive a surgical staple cartridge. The anvil is configured to pivot toward and away from the staple cartridge and lower jaw. The shaft assembly comprises a knife member configured to longitudinally translate to thereby substantially simultaneously cut clamped tissue and staple the severed tissue. The end effector may comprise lockout features configure to prevent longitudinal translation of the knife member. The end effector or staple cartridge may comprise lockout bypass features configured to prevent lockout of the knife member. These lockout bypass features may operate to permit longitudinal translation of the knife member once or multiple times. The end effector may comprise features configured to ensure proper alignment of the anvil relative to the staple cartridge.

Published: 2021-01-14 Assignee: MasterCard International Incorporated.
US20210012341A1
Physics
Application 20210012341, fig. 01

Method and system for blocking and unblocking merchants for future transactions

A method for establishing account controls for a transaction account through specially configured personal identification numbers includes: storing, in an account profile, an account identifier, standard personal identification number (PIN), and blocking PIN; receiving a first authorization request for a first payment transaction including the account identifier, a merchant identifier, and the blocking PIN; inserting the merchant identifier into the account profile; receiving a second authorization request for a second payment transaction including the account identifier and the merchant identifier; and transmitting an authorization response in response to the second authorization request including a response code indicating decline of the second payment transaction.