Patent Applications published on Oct 7, 2021

Explore the 7,914 U.S. Patent Applications published on the 40th week of 2021, including 6,173 applications that subsequently received a Patent Grant.

Featured patent applications from Oct 7, 2021

Published: 2021-10-07 Assignee: Cilag GmbH International.
US20210307754A1
Human necessities
Application 20210307754, fig. 01

Method for authenticating the compatibility of a staple cartridge with a surgical instrument

A method for authenticating the compatibility of a staple cartridge with a surgical instrument is disclosed. The method can comprise inserting a staple cartridge into a surgical instrument, receiving a first signal from a first RFID tag on a first component of the staple cartridge with an RFID reader system, receiving a second signal from a second RFID tag on a second component of the staple cartridge with the RFID reader system, comparing the first signal and the second signal to stored data for a compatible staple cartridge, and locking a staple firing system of the surgical instrument if the first signal and the second signal do not match the stored data for a compatible staple cartridge.

Published: 2021-10-07
US20210307748A1
Human necessities
Application 20210307748, fig. 01

METHODS OF STAPLING TISSUE

A method of stapling tissue is disclosed. The method can include obtaining a staple cartridge including a plurality of staples, wherein each staple has a base and a leg extending from the base. The stapling method can also include firing the staples from the staple cartridge, wherein the staples are fired into tissue in a staple line. The staple line can include a first portion having a first flexibility and a second portion having a second flexibility, wherein the second flexibility is different than the first flexibility. A method of stapling tissue can also include adapting an anvil with an anvil plate having an arrangement of staple-forming pockets that differs from the staple-forming pockets in the anvil.

Published: 2021-10-07 Assignee: ASM IP Holding B.V..
US20210313150A1
Electricity
Application 20210313150, fig. 01

Thin film forming method

A substrate processing method for filling a gap without seams or voids comprising: providing a substrate with a gap in a reaction chamber, pumping down the reaction chamber to a pressure at or below 5 Torr and filling the gap with a film by alternately and sequentially supplying a precursor, a reactant and a radio frequency electromagnetic radiation comprising a relatively high radio frequency component and a relatively low radio frequency component.

Published: 2021-10-07 Assignee: ASM IP Holding B.V..
US20210313167A1
Electricity
Application 20210313167, fig. 02

Method and apparatus for filling a gap

According to the invention there is provided a method of filling one or more gaps created during manufacturing of a feature on a substrate by providing a deposition method comprising; introducing a first reactant to the substrate with a first dose, thereby forming no more than about one monolayer by the first reactant; introducing a second reactant to the substrate with a second dose. The first reactant is introduced with a subsaturating first dose reaching only a top area of the surface of the one or more gaps and the second reactant is introduced with a saturating second dose reaching a bottom area of the surface of the one or more gaps. A third reactant may be provided to the substrate in the reaction chamber with a third dose, the third reactant reacting with at least one of the first and second reactant.

Published: 2021-10-07 Assignee: ASM IP Holding B.V..
US20210313178A1
Electricity
Application 20210313178, fig. 01

Method for forming barrier layer and method for manufacturing semiconductor device

In a method for forming a barrier layer, the barrier layer is formed on a base layer having a three-dimensional structure before a dopant-containing layer is formed on the base layer. At this time, at least one of a film thickness, a film quality, and a film type of the barrier layer is controlled in a height direction of the three-dimensional structure by using an atomic layer deposition (ALD) process.

Published: 2021-10-07 Assignee: ASM IP Holding B.V..
US20210313170A1
Electricity
Application 20210313170, fig. 01

Method of post-deposition treatment for silicon oxide film

A method of post-deposition treatment for silicon oxide film includes: providing in a reaction space a substrate having a recess pattern on which a silicon oxide film is deposited; supplying a reforming gas for reforming the silicon oxide film to the reaction space in the absence of a film-forming precursor, said reforming gas being composed primarily of He and/or H2; and irradiating the reforming gas with microwaves in the reaction space having a pressure of 200 Pa or less to generate a direct microwave plasma to which the substrate is exposed, thereby reforming the silicon oxide film.

Published: 2021-10-07
US20210313182A1
Electricity
Application 20210313182, fig. 01

LAYER FORMING METHOD

There is provided a method of forming a layer, comprising depositing a seed layer on the substrate and depositing a bulk layer on the seed layer. Depositing the seed layer comprises supplying a first precursor comprising metal and halogen atoms to the substrate; and supplying a first reactant to the substrate. Depositing the bulk layer comprises supplying a second precursor comprising metal and halogen atoms to the seed layer and supplying a second reactant to the seed layer.

Published: 2021-10-07 Assignee: ASM IP Holding B.V..
US20210310125A1
Chemistry; metallurgy
Application 20210310125, fig. 01

MULTI-PORT GAS INJECTION SYSTEM AND REACTOR SYSTEM INCLUDING SAME

A gas injection system, a reactor system including the gas injection system, and methods of using the gas injection system and reactor system are disclosed. The gas injection system can be used in gas-phase reactor systems to independently monitor and control gas flow rates in a plurality of channels of a gas injection system coupled to a reaction chamber.

Published: 2021-10-07
US20210307744A1
Human necessities
Application 20210307744, fig. 01

SURGICAL STAPLING DEVICE WITH ADJUSTABLE DISSECTING TIP

A surgical stapling device includes a tool assembly that has a cartridge assembly, an anvil assembly, and a dissector tip. The dissector tip is moveable between a first configuration aligned with a longitudinal axis of the tool assembly and a second configuration defining an acute angle with the longitudinal axis of the tool assembly. The tool assembly includes a retaining member for retaining the dissector tip in one of the first or second positions

Published: 2021-10-07 Assignee: GENGHISCOMM HOLDINGS, LLC, Tybalt, LLC.
US20210314081A1
Electricity
Application 20210314081, fig. 01

Detection, analysis, and countermeasures for radio transceivers

A computer-implementable method employs radio signal metadata to train a cognitive learning and inference system to produce an inferred function, wherein the metadata comprises a syntactic structure of at least one radio communication protocol. The inferred function is used to map metadata of a detected radio signal to a cognitive profile of a transmitter of the detected radio signal. The mapping effects intelligent discrimination of the transmitter from at least one other transmitter through corroborative or negating evidentiary observation of properties associated with the metadata of the detected radio signal. A response to the transmitter is based upon the mapping.