GRENOBLE
France
16
2018-09-20
16
2020-01-14
These are the the leading inventors for applications assigned to ASELTA NANOGRAPHICS:
ASELTA NANOGRAPHICS based in GRENOBLE, FR has been assigned the rights to these inventions. The list includes both Pending Applications and Patent Grants:
Method of applying vertex based corrections to a semiconductor design
#2 | 2018-07-19 ✅ Patent 10,522,328 granted on 2019-12-31Method of performing dose modulation, in particular for electron beam lithography
#3 | 2018-07-19 ✅ Patent 10,578,978 granted on 2020-03-03Method for determining the dose corrections to be applied to an IC manufacturing process by a matching procedure
#4 | 2017-06-15 ✅ Patent 10,295,912 granted on 2019-05-21Method for determining the parameters of an IC manufacturing process model
#5 | 2017-05-04 ✅ Patent 10,423,074 granted on 2019-09-24Method for calculating the metrics of an IC manufacturing process
#6 | 2017-03-16 ✅ Patent 10,156,796 granted on 2018-12-18Method for determining the parameters of an IC manufacturing process by a differential procedure
#7 | 2016-09-01 ✅ Patent 9,891,519 granted on 2018-02-13Free form fracturing method for electronic or optical lithography using resist threshold control
#8 | 2016-07-21 ✅ Patent 10,553,394 granted on 2020-02-04Method for the correction of electron proximity effects
#9 | 2016-03-17 ✅ Patent 10,157,728 granted on 2018-12-18Lithography method with combined optimization of the radiated energy and of the geometry applicable to complex shapes
#10 | 2015-06-04 ✅ Patent 9,922,159 granted on 2018-03-20Free form fracturing method for electronic or optical lithography
#11 | 2014-11-20 ✅ Patent 9,223,926 granted on 2015-12-29Method for correcting electronic proximity effects using the deconvolution of the pattern to be exposed by means of a probabilistic method
#12 | 2014-08-28 ✅ Patent 8,984,451 granted on 2015-03-17Free form fracturing method for electronic or optical lithography
#13 | 2014-06-26 ✅ Patent 9,430,597 granted on 2016-08-30Method for estimating patterns to be printed on a plate or mask by means of electron-beam lithography and corresponding printing device
#14 | 2014-02-27 ✅ Patent 9,542,505 granted on 2017-01-10Method and system for preparing a pattern to be printed on a plate or mask by electron beam lithography
#15 | 2013-10-17 ✅ Patent 9,934,336 granted on 2018-04-03Method of correcting electron proximity effects using Voigt type scattering functions
#16 | 2013-02-21 ✅ Patent 9,224,577 granted on 2015-12-29Method for correcting electronic proximity effects using off-center scattering functions
Also check out Aselta Nanographics' (Grenoble, France) applicant profile with 15 patent applications submitted.
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