Assignee profile:

NIKON PRECISION INC.

City:

Belmont, California

Country:

United States

Published Applications:

18

Last publication date:

2017-12-21

Patent Grants:

15

Last grant date:

2019-03-19

Top Inventors for applications by NIKON PRECISION INC.

These are the the leading inventors for applications assigned to NIKON PRECISION INC.:

Recent patent applications by NIKON PRECISION INC.

NIKON PRECISION INC. based in Belmont, US has been assigned the rights to these inventions. The list includes both Pending Applications and Patent Grants:

#1 | 2017-12-21 ✅ Patent 10,234,756 granted on 2019-03-19
US20170363951A1
Physics

Scanner based optical proximity correction system and method of use

#2 | 2016-06-09 ✅ Patent 9,753,363 granted on 2017-09-05
US20160161842A1
Physics

Scanner based optical proximity correction system and method of use

#3 | 2013-12-19 ✅ Patent 9,529,253 granted on 2016-12-27
US20130339910A1
Physics

Predicting pattern critical dimensions in a lithographic exposure process

#4 | 2013-07-25 ✅ Patent 9,286,416 granted on 2016-03-15
US20130191794A1
Physics

Scanner based optical proximity correction system and method of use

#5 | 2013-02-21
US20130044308A1
Physics

SYSTEM AND METHOD FOR AN ADJUSTING OPTICAL PROXIMITY EFFECT FOR AN EXPOSURE APPARATUS

#6 | 2012-12-27 ✅ Patent 8,572,518 granted on 2013-10-29
US20120331427A1
Physics

Predicting pattern critical dimensions in a lithographic exposure process

#7 | 2010-05-20 ✅ Patent 8,438,507 granted on 2013-05-07
US20100125823A1
Physics

Systems and methods for adjusting a lithographic scanner

#8 | 2010-03-04 ✅ Patent 8,365,107 granted on 2013-01-29
US20100058263A1
Physics

Scanner based optical proximity correction system and method of use

#9 | 2009-08-27 ✅ Patent 8,300,214 granted on 2012-10-30
US20090213349A1
Physics

System and method for an adjusting optical proximity effect for an exposure apparatus

#10 | 2008-04-10 ✅ Patent 8,322,616 granted on 2012-12-04
US20080086440A1
Physics

Automated signature detection system and method of use

#11 | 2007-11-22
US20070270080A1
Performing operations; transporting

NON-CONTACT CHEMICAL MECHANICAL POLISHING WAFER EDGE CONTROL APPARATUS AND METHOD

#12 | 2007-06-21
US20070139630A1
Physics

Changeable Slit to Control Uniformity of Illumination

#13 | 2006-11-16 ✅ Patent 7,169,016 granted on 2007-01-30
US20060258263A1
Performing operations; transporting

Chemical mechanical polishing end point detection apparatus and method

#14 | 2006-03-30 ✅ Patent 8,027,813 granted on 2011-09-27
US20060066841A1
Physics

Method and system for reconstructing aberrated image profiles through simulation

#15 | 2005-12-13 ✅ Patent 6,974,653 granted on 2005-12-13
US10310640
-

Methods for critical dimension and focus mapping using critical dimension test marks

#16 | 2005-10-18 ✅ Patent 6,956,659 granted on 2005-10-18
US10165733
-

Measurement of critical dimensions of etched features

#17 | 2005-09-13 ✅ Patent 6,943,882 granted on 2005-09-13
US10322795
-

Method to diagnose imperfections in illuminator of a lithographic tool

#18 | 2005-01-11 ✅ Patent 6,842,223 granted on 2005-01-11
US10412380
-

Enhanced illuminator for use in photolithographic systems

Also check out NIKON PRECISION INC.'s (Belmont, United States) applicant profile with 4 patent applications submitted.

AssigneeID:

10229 ⎘