TOKYO
Japan
11
2025-12-11
8
2025-07-08
These are the the leading inventors for applications assigned to IAS Inc.:
IAS Inc. based in TOKYO, JP has been assigned the rights to these inventions. The list includes both Pending Applications and Patent Grants:
IMPURITY ACQUISITION SYSTEM, QUALITY INSPECTION SYSTEM, AND LIQUID PRODUCTION AND SUPPLY SYSTEM
#2 | 2023-10-19 ✅ Patent 12,354,862 granted on 2025-07-08METHOD FOR ANALYZING METAL MICROPARTICLES, AND INDUCTIVELY COUPLED PLASMA MASS SPECTROMETRY METHOD
#3 | 2022-02-10 ✅ Patent 11,422,071 granted on 2022-08-23Substrate analysis method and substrate analyzer
#4 | 2021-05-20 ✅ Patent 11,569,081 granted on 2023-01-31Method for analyzing metal fine particles, and inductively coupled plasma mass spectrometry method
#5 | 2021-04-22 ✅ Patent 11,837,510 granted on 2023-12-05Method for analyzing silicon substrate
#6 | 2019-11-28 ✅ Patent 10,688,485 granted on 2020-06-23Substrate analysis nozzle and method for analyzing substrate
#7 | 2019-01-10NOZZLE FOR SUBSTRATE ANALYSIS
#8 | 2018-08-02SILICON SUBSTRATE ANALYZING DEVICE
#9 | 2018-01-25 ✅ Patent 10,024,801 granted on 2018-07-17Analysis system for online-transferred analysis sample
#10 | 2017-06-08 ✅ Patent 10,151,727 granted on 2018-12-11Automatic localized substrate analysis device and analysis method
#11 | 2015-12-10 ✅ Patent 9,741,627 granted on 2017-08-22Substrate etching apparatus and substrate analysis method
Also check out IAS, INC.'s (Tokyo, Japan) applicant profile with 9 patent applications submitted.
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