GenISys GmbH

City:

Taufkirchen

Country:

Germany

Published Applications:

Last publication date:

2018-06-21

Patent Grants:

Last grant date:

2019-09-03

Top Inventors for applications by GenISys GmbH

These are the the leading inventors for applications assigned to GenISys GmbH:

Nezih Uenal 1 Taufkirchen, Germany
Nezih Ünal 1 Taufkirchen, Germany
Ulrich Hofmann 1 Muenchen, Germany
Christoph Sambale 1 Holzkirchen, Germany

Ulrich Hofmann 1 Munich, Germany

Recent patent applications by GenISys GmbH

GenISys GmbH based in Taufkirchen, DE has been assigned the rights to these inventions. The list includes both Pending Applications and Patent Grants:

#1 | 2018-06-21 ✅ Patent 10,401,737 granted on 2019-09-03

US20180173108A1

Physics

Process dose and process bias determination for beam lithography

#2 | 2016-03-17 ✅ Patent 10,409,946 granted on 2019-09-10

US20160078166A1

Physics

Process artefact compensation upon transfer of a mask layout onto a mask substrate

Also check out GenISys GmbH's (Taufkirchen, Germany) applicant profile with 2 patent applications submitted.

AssigneeID:

106319 ⎘