Anseong-si
South Korea
27
2026-04-30
21
2025-11-18
These are the the leading inventors for applications assigned to K.C.Tech Co., Ltd.:
K.C.Tech Co., Ltd. based in Anseong-si, KR has been assigned the rights to these inventions. The list includes both Pending Applications and Patent Grants:
ETCHING AGENT COMPOSITION AND ETCHING METHOD USING THE SAME
#2 | 2025-01-02SLURRY COMPOSITION FOR METAL POLISHING
#3 | 2023-12-14SUBSTRATE CLEANING APPARATUS
#4 | 2023-11-23SUBSTRATE CHUCK USED IN SCRUBBING PROCESS
#5 | 2023-08-31 ✅ Patent 12,472,532 granted on 2025-11-18SUBSTRATE TREATING APPARATUS AND CLEANING NOZZLE USED THEREIN
#6 | 2023-08-17 ✅ Patent 12,451,370 granted on 2025-10-21SUBSTRATE PROCESSING SYSTEM WITH VERTICAL ARRANGEMENT STRUCTURE
#7 | 2023-08-17 ✅ Patent 12,421,424 granted on 2025-09-23SLURRY COMPOSITION AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE BY USING THE SAME
#8 | 2023-02-02 ✅ Patent 12,448,542 granted on 2025-10-21SLURRY COMPOSITION FOR POLISHING ORGANIC FILM
#9 | 2022-09-01 ✅ Patent 12,394,627 granted on 2025-08-19SUBSTRATE POLISHING SYSTEM
#10 | 2022-05-12 ✅ Patent 12,091,636 granted on 2024-09-17Composition for dissolving abrasive particles and cleaning method using the same
#11 | 2021-07-29 ✅ Patent 11,311,979 granted on 2022-04-26Apparatus and method for manufacturing display device
#12 | 2021-05-06 ✅ Patent 11,279,852 granted on 2022-03-22CMP slurry compositions and methods of fabricating a semiconductor device using the same
#13 | 2020-09-17 ✅ Patent 11,749,549 granted on 2023-09-05Substrate processing apparatus with an air curtain in a loading/unloading part
#14 | 2020-05-28 ✅ Patent 11,612,981 granted on 2023-03-28Substrate processing apparatus
#15 | 2020-05-14 ✅ Patent 11,597,055 granted on 2023-03-07Carrier head of polishing apparatus and membrane used therein
#16 | 2020-03-05SLURRY COMPOSITION FOR CHEMICAL MECHANICAL POLISHING
#17 | 2020-01-09SUBSTRATE PROCESSING APPARATUS
#18 | 2020-01-09 ✅ Patent 11,407,081 granted on 2022-08-09Substrate processing apparatus
#19 | 2018-11-15 ✅ Patent 10,784,113 granted on 2020-09-22Chemical mechanical polishing apparatus
#20 | 2017-11-09 ✅ Patent 10,002,777 granted on 2018-06-19Substrate processing system and substrate processing method
#21 | 2017-11-09 ✅ Patent 10,518,382 granted on 2019-12-31Substrate processing system
#22 | 2017-06-29 ✅ Patent 10,421,883 granted on 2019-09-24Abrasive particle-dispersion layer composite and polishing slurry composition including the same
#23 | 2017-06-29 ✅ Patent 10,494,547 granted on 2019-12-03Additive composition and positive polishing slurry composition including the same
#24 | 2017-06-15 ✅ Patent 10,138,395 granted on 2018-11-27Abrasive particle-dispersion layer composite and polishing slurry composition including the same
#25 | 2017-02-23 ✅ Patent 10,428,240 granted on 2019-10-01Method for preparing slurry composition and slurry composition prepared thereby
#26 | 2017-01-26 ✅ Patent 10,077,381 granted on 2018-09-18Polishing slurry composition
#27 | 2017-01-12 ✅ Patent 9,994,735 granted on 2018-06-12Slurry composition for polishing tungsten
Also check out KCTECH CO., LTD.'s (Anseong-si, South Korea) applicant profile with 16 patent applications submitted.
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