DOSILICON CO., LTD.

City:

Shanghai

Country:

China

Published Applications:

Last publication date:

2019-08-01

Patent Grants:

Last grant date:

2020-10-20

Top Inventors for applications by DOSILICON CO., LTD.

These are the the leading inventors for applications assigned to DOSILICON CO., LTD.:

Tae Gyoung KANG 3 Yongin-si, South Korea
Jin-Ho Kim 2 Hwaseong-si, South Korea

Recent patent applications by DOSILICON CO., LTD.

DOSILICON CO., LTD. based in Shanghai, CN has been assigned the rights to these inventions. The list includes both Pending Applications and Patent Grants:

#1 | 2019-08-01 ✅ Patent 10,811,418 granted on 2020-10-20

US20190237467A1

Electricity

DRAM cell array using facing bar and method of fabricating the same

#2 | 2019-05-16 ✅ Patent 10,461,091 granted on 2019-10-29

US20190148388A1

Electricity

NAND flash memory device having facing bar and method of fabricating the same

#3 | 2018-02-01 ✅ Patent 10,177,153 granted on 2019-01-08

US20180033791A1

Electricity

DRAM cell for reducing layout area and fabricating method thereof

Also check out DOSILICON CO., LTD.'s (Shanghai, China) applicant profile with 3 patent applications submitted.

AssigneeID:

131837 ⎘