Tokyo
Japan
50
2018-06-14
46
2019-03-26
These are the the leading inventors for applications assigned to Nikko-Materials Co., Ltd.:
Nikko-Materials Co., Ltd. based in Tokyo, JP has been assigned the rights to these inventions. The list includes both Pending Applications and Patent Grants:
Laminating apparatus
#2 | 2015-01-29 ✅ Patent 10,081,170 granted on 2018-09-25Laminating apparatus
#3 | 2010-01-26 ✅ Patent 7,651,783 granted on 2010-01-26Surface treated copper film
#4 | 2007-06-14 ✅ Patent 7,788,882 granted on 2010-09-07Packaging device and packaging method for hollow cathode type sputtering target
#5 | 2007-05-17 ✅ Patent 7,951,275 granted on 2011-05-31Sputtering target and method for finishing surface of such target
#6 | 2007-05-10 ✅ Patent 8,172,960 granted on 2012-05-08Tantalum sputtering target and method of manufacturing same
#7 | 2007-05-03 ✅ Patent 7,510,635 granted on 2009-03-31High purity zinc oxide powder and method for production thereof, and high purity zinc oxide target and thin film of high purity zinc oxide
#8 | 2007-05-03NI-PT ALLOY AND TARGET COMPRISING THE ALLOY
#9 | 2007-05-03 ✅ Patent 7,300,501 granted on 2007-11-27Electroless gold plating liquid
#10 | 2007-04-05 ✅ Patent 7,605,481 granted on 2009-10-20Nickel alloy sputtering target and nickel alloy thin film
#11 | 2007-03-08 ✅ Patent 7,695,527 granted on 2010-04-13High purity copper sulfate and method for production thereof
#12 | 2007-03-08 ✅ Patent 9,472,383 granted on 2016-10-18Copper or copper alloy target/copper alloy backing plate assembly
#13 | 2007-02-20 ✅ Patent 7,179,741 granted on 2007-02-20Electroless plating method and semiconductor wafer on which metal plating layer is formed
#14 | 2007-02-01 ✅ Patent 7,892,367 granted on 2011-02-22Tantalum sputtering target
#15 | 2006-12-28 ✅ Patent 8,871,144 granted on 2014-10-28High-purity Ni-V alloy target therefrom high-purity Ni-V alloy thin film and process for producing high-purity Ni-V alloy
#16 | 2006-11-30 ✅ Patent 7,390,354 granted on 2008-06-24Electroless gold plating solution
#17 | 2006-11-30High purity hafnium, target and thin film comprising said high purity hafnium, and method for producing high purity hafnium
#18 | 2006-10-19 ✅ Patent 7,419,536 granted on 2008-09-02Electroless gold plating liquid
#19 | 2006-09-28 ✅ Patent 7,432,335 granted on 2008-10-07Basic silane coupling agent organic carboxylate composition, method for producing the same, and epoxy resin composition containing the same
#20 | 2006-08-24 ✅ Patent 7,459,036 granted on 2008-12-02Hafnium alloy target and process for producing the same
#21 | 2006-08-22 ✅ Patent 7,094,845 granted on 2006-08-22Basic silane coupling agent organic carboxylate composition, method for producing the same, and epoxy resin composition containing the same
#22 | 2006-08-10 ✅ Patent 8,231,728 granted on 2012-07-31Epitaxial growth process
#23 | 2006-07-27 ✅ Patent 7,777,078 granted on 2010-08-17Copper electrolytic solution and electrolytic copper foil produced therewith
#24 | 2006-07-06 ✅ Patent 7,635,440 granted on 2009-12-22Sputtering target, thin film for optical information recording medium and process for producing the same
#25 | 2006-06-29 ✅ Patent 7,618,505 granted on 2009-11-17Target of high-purity nickel or nickel alloy and its producing method
#26 | 2006-05-11 ✅ Patent 7,344,660 granted on 2008-03-18Sputtering target and process for producing the same
#27 | 2006-04-27Ge-cr alloy sputtering target and process for producing the same
#28 | 2006-04-06 ✅ Patent 7,252,794 granted on 2007-08-07Electroconductive oxide sintered compact, sputtering target comprising the sintered compact and methods for producing them
#29 | 2006-03-16 ✅ Patent 8,173,093 granted on 2012-05-08Iron silicide sputtering target and method for production thereof
#30 | 2006-02-28 ✅ Patent 7,005,055 granted on 2006-02-28Copper electrolytic solution containing amine compound having specific skeleton and organosulfur compound as additives, and electrolytic copper foil produced using the same
#31 | 2006-02-23Nickel alloy sputtering target
#32 | 2006-02-21 ✅ Patent 7,002,230 granted on 2006-02-21CdTe-base compound semiconductor single crystal for electro-optic element
#33 | 2006-01-05 ✅ Patent 7,740,796 granted on 2010-06-22Iron silicide powder and method for production thereof
#34 | 2005-12-08 ✅ Patent 7,347,969 granted on 2008-03-25Iron-based sintered compact and method for production thereof
#35 | 2005-12-08 ✅ Patent 7,699,948 granted on 2010-04-20Ta sputtering target and method for preparation thereof
#36 | 2005-11-17 ✅ Patent 7,378,160 granted on 2008-05-27Copper electrolytic solution containing amine compound having specific skeleton and organosulfur compound as additives, and electrolytic copper foil produced using the same
#37 | 2005-11-01 ✅ Patent 6,960,391 granted on 2005-11-01Carrier-attached copper foil and printed board using the copper foil
#38 | 2005-10-20 ✅ Patent 7,887,603 granted on 2011-02-15High purity copper sulfate and method for production thereof
#39 | 2005-09-01 ✅ Patent 7,045,871 granted on 2006-05-16II-VI compound semiconductor crystal and photoelectric conversion device
#40 | 2005-08-23 ✅ Patent 6,933,519 granted on 2005-08-23II-VI compound semiconductor crystal
#41 | 2005-08-16 ✅ Patent 6,929,772 granted on 2005-08-16Manufacturing method of ito powder with tin dissolved in indium oxide, and manufacturing method of ito target
#42 | 2005-08-11 ✅ Patent 7,144,491 granted on 2006-12-05Copper electrolytic solution containing organic sulfur compound and quaternary amine compound of specified skeleton as additives and electrolytic copper foil produced therewith
#43 | 2005-07-28 ✅ Patent 7,109,273 granted on 2006-09-19Solid silane coupling agent composition, process for producing the same, and resin composition containing the same
#44 | 2005-07-26 ✅ Patent 6,921,577 granted on 2005-07-26Water-based metal surface treatment agent
#45 | 2005-07-14 ✅ Patent 7,288,242 granted on 2007-10-30Lithium-containing complex oxide and method of producing same
#46 | 2005-07-12 ✅ Patent 6,916,865 granted on 2005-07-12Organic carboxylic acid salt composition, process for preparation thereof and additives for epoxy resins
#47 | 2005-06-02 ✅ Patent 7,229,494 granted on 2007-06-12Production method for compound semiconductor single crystal
#48 | 2005-05-31 ✅ Patent 6,900,522 granted on 2005-05-31Chamfered semiconductor wafer and method of manufacturing the same
#49 | 2005-04-05 ✅ Patent 6,875,272 granted on 2005-04-05Method for preparing GaN based compound semiconductor crystal
#50 | 2005-01-06 ✅ Patent 6,989,059 granted on 2006-01-24Process for producing single crystal of compound semiconductor and crystal growing apparatus
Also check out Nikko-Materials Co., Ltd.'s (Tokyo, Japan) applicant profile with 1 patent applications submitted.
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