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Assignee profile:

HEMLOCK SEMICONDUCTOR CORPORATION

City:

Hemlock, Michigan

Country:

United States

Published Applications:

15

Last publication date:

2018-08-09

Patent Grants:

12

Last grant date:

2019-10-01

Top Inventors for applications by HEMLOCK SEMICONDUCTOR CORPORATION

These are the the leading inventors for applications assigned to HEMLOCK SEMICONDUCTOR CORPORATION:

Recent patent applications by HEMLOCK SEMICONDUCTOR CORPORATION

HEMLOCK SEMICONDUCTOR CORPORATION based in Hemlock, US has been assigned the rights to these inventions. The list includes both Pending Applications and Patent Grants:

#1 | 2018-08-09 ✅ Patent 10,431,447 granted on 2019-10-01
US20180226243A1
Electricity

Polysilicon chip reclamation assembly and method of reclaiming polysilicon chips from a polysilicon cleaning apparatus

 #2 | 2015-01-15 ✅ Patent 9,687,876 granted on 2017-06-27
US20150017335A1
Performing operations; transporting

Method of repairing and/or protecting a surface in a reactor

 #3 | 2014-11-27 ✅ Patent 9,079,145 granted on 2015-07-14
US20140348712A1
Performing operations; transporting

Solids processing valve

 #4 | 2014-08-07
US20140220347A1
Electricity

ELECTRODE COMPOSITION COMPRISING A SILICON POWDER AND METHOD OF CONTROLLING THE CRYSTALLINITY OF A SILICON POWDER

 #5 | 2014-06-19
US20140165909A1
Chemistry; metallurgy

Manufacturing Apparatus For Depositing A Material On A Carrier Body

 #6 | 2013-03-28 ✅ Patent 9,261,464 granted on 2016-02-16
US20130075627A1
Physics

Applying edge-on photoluminescence to measure bulk impurities of semiconductor materials

 #7 | 2012-09-13 ✅ Patent 8,895,324 granted on 2014-11-25
US20120227472A1
Mechanical engineering

Method of determining an amount of impurities that a contaminating material contributes to high purity silicon

 #8 | 2012-03-22
US20120070362A1
Physics

QUANTITATIVE MEASUREMENT OF GAS PHASE PROCESS INTERMEDIATES USING RAMAN SPECTROSCOPY

 #9 | 2011-09-20 ✅ Patent 8,021,483 granted on 2011-09-20
US10298129
-

Flowable chips and methods for the preparation and use of same, and apparatus for use in the methods

 #10 | 2011-08-04 ✅ Patent 8,609,058 granted on 2013-12-17
US20110189074A1
Chemistry; metallurgy

Silicon production with a fluidized bed reactor integrated into a Siemens-type process

 #11 | 2011-02-17 ✅ Patent 8,951,352 granted on 2015-02-10
US20110036294A1
Chemistry; metallurgy

Manufacturing apparatus for depositing a material and an electrode for use therein

 #12 | 2011-02-10 ✅ Patent 8,784,565 granted on 2014-07-22
US20110031115A1
Chemistry; metallurgy

Manufacturing apparatus for depositing a material and an electrode for use therein

 #13 | 2010-05-06 ✅ Patent 7,927,984 granted on 2011-04-19
US20100112744A1
Mechanical engineering

Silicon production with a fluidized bed reactor utilizing tetrachlorosilane to reduce wall deposition

 #14 | 2008-03-06 ✅ Patent 7,935,327 granted on 2011-05-03
US20080056979A1
Chemistry; metallurgy

Silicon production with a fluidized bed reactor integrated into a siemens-type process

 #15 | 2006-07-25 ✅ Patent 7,080,742 granted on 2006-07-25
US10796351
-

Method and apparatus for improving silicon processing efficiency

Also check out Hemlock Semiconductor Corporation's (Hemlock, United States) applicant profile with 9 patent applications submitted.

AssigneeID:

15567 ⎘