MICRO PROCESS INC.

City:

KOSHIGAYA-SHI

Country:

Japan

Published Applications:

Last publication date:

2015-06-18

Patent Grants:

Last grant date:

2017-04-18

Top Inventors for applications by MICRO PROCESS INC.

These are the the leading inventors for applications assigned to MICRO PROCESS INC.:

Kazuo Watanabe 3 Koshigaya, Japan
Kazuo Watanabe 3 Koshigaya-shi, Japan
Zhaowen Lin 2 Taoyuan Hsien, Taiwan
Akifumi Ueda 2 Toyohashi-shi, Japan

Weiren Lan 2 Taoyuan Hsien, Taiwan
Hidetaka Nakagawara 2 Toyohashi-shi, Japan
Hidetaka Nakagawara 2 Toyohashi, Japan
Wei Jen Lan 2 Taoyuan Hsien, Taiwan

Chao Wen Lin 2 Taoyuan Hsien, Taiwan
Shigeki Watanabe 2 Koshigaya, Japan
Shigeki Watanabe 2 Koshigaya-shi, Japan
Akifumi Ueda 2 Toyohashi, Japan

Saki Fujita 1 Toyohashi, Japan
Saki Fujita 1 Toyohashi-shi, Japan
Akifumi Ueda 1 Tsukuba-shi, Japan
Shintaro Okada 1 Toyohashi-shi, Japan

Shigeki Watanabe 1 Tokyo, Japan
Hidetaka Nakagawara 1 Otake, Japan
Shintaro Okada 1 Toyohashi, Japan
Akifumi Ueda 1 Tsukuba, Japan

Hidetaka Nakagawara 1 Otake-shi, Japan

Recent patent applications by MICRO PROCESS INC.

MICRO PROCESS INC. based in KOSHIGAYA-SHI, JP has been assigned the rights to these inventions. The list includes both Pending Applications and Patent Grants:

#1 | 2015-06-18 ✅ Patent 9,625,812 granted on 2017-04-18

US20150168832A1

Physics

Photosensitive resin composition, photosensitive dry film, pattern formation method, printed circuit board, and method for producing same

#2 | 2013-01-03 ✅ Patent 8,647,807 granted on 2014-02-11

US20130004895A1

Physics

Photosensitive resin composition, photosensitive dry film and method for forming pattern

#3 | 2012-11-29 ✅ Patent 8,647,806 granted on 2014-02-11

US20120301830A1

Physics

Photosensitive resin composition, photosensitive dry film and method for forming pattern

Also check out MICRO PROCESS INC.'s (Koshigaya-shi, Japan) applicant profile with 1 patent applications submitted.

AssigneeID:

1683 ⎘