Beaverton, Oregon
United States
8
2024-11-07
5
2016-03-29
These are the the leading inventors for applications assigned to Lotus Applied Technology, LLC:
Lotus Applied Technology, LLC based in Beaverton, US has been assigned the rights to these inventions. The list includes both Pending Applications and Patent Grants:
METHODS AND SYSTEMS FOR INHIBITING PRECURSOR INTERACTIONS DURING RADICAL-ENHANCED ATOMIC LAYER DEPOSITION
#2 | 2024-11-07METHODS AND SYSTEMS FOR SELECTIVE ATOMIC LAYER DEPOSITION
#3 | 2012-01-26 ✅ Patent 9,297,076 granted on 2016-03-29Substrate transport mechanism contacting a single side of a flexible web substrate for roll-to-roll thin film deposition
#4 | 2011-10-20 ✅ Patent 8,637,117 granted on 2014-01-28Inhibiting excess precursor transport between separate precursor zones in an atomic layer deposition system
#5 | 2011-06-30 ✅ Patent 8,637,123 granted on 2014-01-28Oxygen radical generation for radical-enhanced thin film deposition
#6 | 2010-06-10HIGH RATE DEPOSITION OF THIN FILMS WITH IMPROVED BARRIER LAYER PROPERTIES
#7 | 2008-08-14 ✅ Patent 7,923,068 granted on 2011-04-12Fabrication of composite materials using atomic layer deposition
#8 | 2007-09-27 ✅ Patent 8,137,464 granted on 2012-03-20Atomic layer deposition system for coating flexible substrates
Also check out LOTUS APPLIED TECHNOLOGY, LLC's (BEAVERTON, United States) applicant profile with 2 patent applications submitted.
174947 ⎘