Sunnyvale, California
United States
23
2012-10-04
13
2014-04-15
These are the the leading inventors for applications assigned to SYNOS TECHNOLOGY, INC.:
SYNOS TECHNOLOGY, INC. based in Sunnyvale, US has been assigned the rights to these inventions. The list includes both Pending Applications and Patent Grants:
Magnetic field assisted deposition
#2 | 2012-08-23DEPOSITING THIN LAYER OF MATERIAL ON PERMEABLE SUBSTRATE
#3 | 2012-08-23 ✅ Patent 9,163,310 granted on 2015-10-20Enhanced deposition of layer on substrate using radicals
#4 | 2012-08-16 ✅ Patent 8,877,300 granted on 2014-11-04Atomic layer deposition using radicals of gas mixture
#5 | 2012-08-16 ✅ Patent 8,840,958 granted on 2014-09-23Combined injection module for sequentially injecting source precursor and reactant precursor
#6 | 2012-05-24Extended Reactor Assembly with Multiple Sections for Performing Atomic Layer Deposition on Large Substrate
#7 | 2012-05-10Radical Reactor with Multiple Plasma Chambers
#8 | 2012-04-26 ✅ Patent 9,129,913 granted on 2015-09-08Formation of barrier layer on device using atomic layer deposition
#9 | 2012-04-19 ✅ Patent 8,771,791 granted on 2014-07-08Deposition of layer using depositing apparatus with reciprocating susceptor
#10 | 2012-02-02Rotating Reactor Assembly for Depositing Film on Substrate
#11 | 2012-01-26Treating Surface of Substrate Using Inert Gas Plasma in Atomic Layer Deposition
#12 | 2011-12-01Protective structure enclosing device on flexible substrate
#13 | 2011-10-27VAPORIZING OR ATOMIZING OF ELECTRICALLY CHARGED DROPLETS
#14 | 2011-03-31VAPOR DEPOSITION REACTOR FOR FORMING THIN FILM ON CURVED SURFACE
#15 | 2010-12-09 ✅ Patent 8,758,512 granted on 2014-06-24Vapor deposition reactor and method for forming thin film
#16 | 2010-08-26 ✅ Patent 8,257,799 granted on 2012-09-04Method for forming thin film using radicals generated by plasma
#17 | 2010-07-22 ✅ Patent 8,871,628 granted on 2014-10-28Electrode structure, device comprising the same and method for forming electrode structure
#18 | 2010-03-18 ✅ Patent 8,851,012 granted on 2014-10-07Vapor deposition reactor using plasma and method for forming thin film using the same
#19 | 2010-03-18 ✅ Patent 8,770,142 granted on 2014-07-08Electrode for generating plasma and plasma generator
#20 | 2010-02-18 ✅ Patent 8,470,718 granted on 2013-06-25Vapor deposition reactor for forming thin film
#21 | 2010-02-18 ✅ Patent 8,263,502 granted on 2012-09-11Forming substrate structure by filling recesses with deposition material
#22 | 2010-02-18Plasma Reactor Having Injector
#23 | 2010-02-18Vapor Deposition Reactor
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