HERAEUS INC.

METHODOLOGY FOR RECYCLING RU AND RU-ALLOY DEPOSITION TARGETS & TARGETS MADE OF RECYCLED RU AND RU-BASED ALLOY POWDERS

#2 | 2009-10-15

US20090258238A1

SILICIDE FORMATION UTILIZING NI-DOPED COBALT DEPOSITION SOURCE

#3 | 2009-05-28

US20090134015A1

ENHANCED OXYGEN NON-STOICHIOMETRY COMPENSATION FOR THIN FILMS

#4 | 2009-05-14

US20090120237A1

ENHANCED FORMULATION OF COBALT ALLOY MATRIX COMPOSITIONS

#5 | 2009-04-30 ✅ Patent 8,118,906 granted on 2012-02-21

US20090107837A1

Performing operations; transporting

Methodology for recycling Ru and Ru-alloy deposition targets and targets made of recycled Ru and Ru-based alloy powders

#6 | 2009-02-26

US20090053089A1

HOMOGENEOUS GRANULATED METAL BASED and METAL-CERAMIC BASED POWDERS

#7 | 2009-01-29

US20090028744A1

Ultra-high purity NiPt alloys and sputtering targets comprising same

#8 | 2009-01-08

US20090010792A1

Brittle metal alloy sputtering targets and method of fabricating same

#9 | 2008-10-30

US20080268292A1

Hexagonal close-packed ceramic seedlayers for perpendicular magnetic recording media

#10 | 2008-10-02

US20080238601A1

Inductive devices with granular magnetic materials

#11 | 2008-09-04

US20080210555A1

HIGH DENSITY CERAMIC AND CERMET SPUTTERING TARGETS BY MICROWAVE SINTERING

#12 | 2008-07-24

US20080173543A1

LOW OXYGEN CONTENT, CRACK-FREE HEUSLER AND HEUSLER-LIKE ALLOYS & DEPOSITION SOURCES & METHODS OF MAKING SAME

#13 | 2008-07-10

US20080166596A1

RE-BASED ALLOYS USABLE AS DEPOSITION TARGETS FOR FORMING INTERLAYERS IN GRANULAR PERPENDICULAR MAGNETIC RECORDING MEDIA & MEDIA UTILIZING SAID ALLOYS

#14 | 2008-07-10

US20080166255A1

HIGH DENSITY, LOW OXYGEN RE AND RE-BASED CONSOLIDATED POWDER MATERIALS FOR USE AS DEPOSITION SOURCES & METHODS OF MAKING SAME

#15 | 2008-06-19

US20080145692A1

MAGNETIC PULSE-ASSISTED CASTING OF METAL ALLOYS & METAL ALLOYS PRODUCED THEREBY

#16 | 2008-05-22

US20080116887A1

Method and apparatus for automation of PTF measurement in sputter targets

#17 | 2008-03-06

US20080057350A1

Magnetic media and sputter targets with compositions of high anisotropy alloys and oxide compounds

#18 | 2008-02-28

US20080050263A1

Enhanced sputter target manufacturing method

#19 | 2008-01-31

US20080026255A1

Alloy and architecture design for heat-assisted magnetic recording

#20 | 2008-01-17

US20080014109A1

Enhanced sputter target manufacturing method

#21 | 2007-12-25 ✅ Patent 7,311,874 granted on 2007-12-25

US10739401

Sputter target and method for fabricating sputter target including a plurality of materials

#22 | 2007-11-22

US20070269330A1

Enhanced sputter target manufacturing method

#23 | 2007-11-01

US20070253103A1

Soft magnetic underlayer in magnetic media and soft magnetic alloy based sputter target

#24 | 2007-07-26

US20070169853A1

Magnetic sputter targets manufactured using directional solidification

#25 | 2007-06-12 ✅ Patent 7,229,588 granted on 2007-06-12

US10755229

Mechanically alloyed precious metal magnetic sputtering targets fabricated using rapidly solidified alloy powders and elemental Pt metal

#26 | 2007-05-24 ✅ Patent 7,397,013 granted on 2008-07-08

US20070114212A1

Plasma lineation electrode

#27 | 2007-02-13 ✅ Patent 7,175,802 granted on 2007-02-13

US10243948

Refurbishing spent sputtering targets

#28 | 2007-01-25

US20070017803A1

Enhanced sputter target manufacturing method

#29 | 2007-01-11

US20070007130A1

Enhanced magnetron sputtering target

#30 | 2006-12-28

US20060289294A1

Enhanced oxygen non-stoichiometry compensation for thin films

#31 | 2006-10-19 ✅ Patent 7,494,617 granted on 2009-02-24

US20060233658A1

Enhanced formulation of cobalt alloy matrix compositions

#32 | 2006-05-25

US20060110626A1

Carbon containing sputter target alloy compositions

#33 | 2006-04-13

US20060078457A1

Low oxygen content alloy compositions

#34 | 2005-12-15

US20050274221A1