SIJTECHNOLOGY, INC.

City:

Ibaraki

Country:

Japan

Published Applications:

Last publication date:

2012-08-16

Patent Grants:

Last grant date:

2015-02-17

Top Inventors for applications by SIJTECHNOLOGY, INC.

These are the the leading inventors for applications assigned to SIJTECHNOLOGY, INC.:

Kazuhiro Murata 1 Tsukuba, Japan
Hiroshi YOKOYAMA 1 Tsukuba-shi, Japan
Kazuhiro MURATA 1 Tsukuba-shi, Japan
Hiroshi Yokoyama 1 Tsukuba, Japan

Yuji Sone 1 Kanagawa, Japan
Kazuhiro Murata 1 Ibaraki, Japan
Yuki Nakamura 1 Tokyo, Japan
Kazuyuki Masuda 1 Ibaraki, Japan

Yukiko Abe 1 Kanagawa, Japan
Naoyuki Ueda 1 Kanagawa, Japan

Recent patent applications by SIJTECHNOLOGY, INC.

SIJTECHNOLOGY, INC. based in Ibaraki, JP has been assigned the rights to these inventions. The list includes both Pending Applications and Patent Grants:

#1 | 2012-08-16 ✅ Patent 8,956,969 granted on 2015-02-17

US20120206068A1

Electricity

Hole formation method, multilayer wiring, semiconductor device, display element, image display device, and system containing via hole formed by the hole formation method

#2 | 2006-09-07 ✅ Patent 8,021,593 granted on 2011-09-20

US20060198959A1

Performing operations; transporting

Method of producing a three-dimensional structure and fine three-dimensional structure

AssigneeID:

188227 ⎘