AIXTRON AG

City:

Herzogenrath

Country:

Germany

Published Applications:

Last publication date:

2011-12-01

Patent Grants:

Last grant date:

2014-04-01

Top Inventors for applications by AIXTRON AG

These are the the leading inventors for applications assigned to AIXTRON AG:

Markus Gersdorff 2 Herzogenrath, Germany
Nalin Lalith RUPESINGHE 1 Cambridge, United Kingdom
Pagadala Gopi Baskar 1 Duisburg, Germany
Kenneth Boh Khin Teo 1 Cambridge, United Kingdom

Nico Meyer 1 Aachen, Germany
Nalin L. RUPESINGHE 1 Cambridge, United Kingdom
Kenneth B. K. TEO 1 Cambridge, United Kingdom

Recent patent applications by AIXTRON AG

AIXTRON AG based in Herzogenrath, DE has been assigned the rights to these inventions. The list includes both Pending Applications and Patent Grants:

#1 | 2011-12-01

US20110293832A1

Performing operations; transporting

Method and apparatus for depositing thin layers of polymeric para-xylylene or substituted para-xylylene

#2 | 2011-04-07 ✅ Patent 8,685,500 granted on 2014-04-01

US20110081504A1

Chemistry; metallurgy

Method for depositing a thin-film polymer in a low-pressure gas phase

#3 | 2011-03-24

US20110070370A1

Chemistry; metallurgy

THERMAL GRADIENT ENHANCED CHEMICAL VAPOUR DEPOSITION (TGE-CVD)

#4 | 2007-07-26 ✅ Patent 7,842,135 granted on 2010-11-30

US20070169702A1

Chemistry; metallurgy

Equipment innovations for nano-technology aquipment, especially for plasma growth chambers of carbon nanotube and nanowire

AssigneeID:

209525 ⎘