FUJIFILM Corpoation

City:

Tokyo

Country:

Japan

Published Applications:

Last publication date:

2010-03-25

Patent Grants:

Last grant date:

2012-09-25

Top Inventors for applications by FUJIFILM Corpoation

These are the the leading inventors for applications assigned to FUJIFILM Corpoation:

Toshiya TAKAHASHI 1 Odawara-shi, Japan
Toshiya Takahashi 1 Odawara, Japan

Recent patent applications by FUJIFILM Corpoation

FUJIFILM Corpoation based in Tokyo, JP has been assigned the rights to these inventions. The list includes both Pending Applications and Patent Grants:

#1 | 2010-03-25 ✅ Patent 8,273,419 granted on 2012-09-25

US20100075150A1

Chemistry; metallurgy

Method of forming gas barrier layers including a change in pressure, a gas barrier layer formed by the method, and a gas barrier film

AssigneeID:

233446 ⎘