Tokyo
Japan
5
2010-09-09
5
2012-04-17
These are the the leading inventors for applications assigned to CRESTEC CORPORATION:
CRESTEC CORPORATION based in Tokyo, JP has been assigned the rights to these inventions. The list includes both Pending Applications and Patent Grants:
Aberration evaluation pattern, aberration evaluation method, aberration correction method, electron beam drawing apparatus, electron microscope, master, stamper, recording medium, and structure
#2 | 2010-03-25 ✅ Patent 8,232,711 granted on 2012-07-31Surface emission type electron source and drawing device
#3 | 2009-07-16 ✅ Patent 7,929,396 granted on 2011-04-19Electron beam applying apparatus and drawing apparatus
#4 | 2007-04-19 ✅ Patent 7,522,510 granted on 2009-04-21Electron beam applying apparatus and drawing apparatus
#5 | 2005-01-27 ✅ Patent 6,989,536 granted on 2006-01-24Electron-beam writing device and electron-beam writing method
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