REALIZE ADVANCED TECHNOLOGY LIMITED

City:

Tokyo

Country:

Japan

Published Applications:

Last publication date:

2009-04-02

Patent Grants:

Last grant date:

Top Inventors for applications by REALIZE ADVANCED TECHNOLOGY LIMITED

These are the the leading inventors for applications assigned to REALIZE ADVANCED TECHNOLOGY LIMITED:

Osamu NAKAMURA 1 Tokyo, Japan
Yoshishige Takikawa 1 Tokyo, Japan
Tatsuro Yoshida 1 Tokyo, Japan
Ryoichi Okura 1 Tokyo, Japan

Recent patent applications by REALIZE ADVANCED TECHNOLOGY LIMITED

REALIZE ADVANCED TECHNOLOGY LIMITED based in Tokyo, JP has been assigned the rights to these inventions. The list includes both Pending Applications and Patent Grants:

#1 | 2009-04-02

US20090084409A1

Physics

Cleaning apparatus, cleaning system using cleaning apparatus, cleaning method of substrate-to-be-cleaned

AssigneeID:

245084 ⎘