Natick, Massachusetts
United States
4
2009-05-14
4
2010-11-23
These are the the leading inventors for applications assigned to ADVANCED METROLOGY SYSTEMS LLC:
ADVANCED METROLOGY SYSTEMS LLC based in Natick, US has been assigned the rights to these inventions. The list includes both Pending Applications and Patent Grants:
Method of measuring deep trenches with model-based optical spectroscopy
#2 | 2008-05-29 ✅ Patent 7,499,183 granted on 2009-03-03Method of measuring sub-micron trench structures
#3 | 2008-02-05 ✅ Patent 7,327,468 granted on 2008-02-05Opto-acoustic apparatus with optical heterodyning for measuring solid surfaces and thin films
#4 | 2006-09-14 ✅ Patent 7,365,864 granted on 2008-04-29Method of determining properties of patterned thin film metal structures using transient thermal response
264906 ⎘