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Assignee profile:

EUV LLC

City:

Santa Clara, California

Country:

United States

Published Applications:

18

Last publication date:

2010-05-20

Patent Grants:

18

Last grant date:

2010-06-22

Top Inventors for applications by EUV LLC

These are the the leading inventors for applications assigned to EUV LLC:

Recent patent applications by EUV LLC

EUV LLC based in Santa Clara, US has been assigned the rights to these inventions. The list includes both Pending Applications and Patent Grants:

#1 | 2010-05-20 ✅ Patent 7,740,916 granted on 2010-06-22
US20100124723A1
Physics

Method for the protection of extreme ultraviolet lithography optics

 #2 | 2010-02-16 ✅ Patent 7,662,263 granted on 2010-02-16
US10256317
-

Figure correction of multilayer coated optics

 #3 | 2009-01-06 ✅ Patent 7,473,301 granted on 2009-01-06
US10245218
-

Adhesive particle shielding

 #4 | 2006-12-12 ✅ Patent 7,147,722 granted on 2006-12-12
US10852545
-

Method for in-situ cleaning of carbon contaminated surfaces

 #5 | 2006-11-23 ✅ Patent 7,273,289 granted on 2007-09-25
US20060262435A1
Physics

Vacuum compatible, high-speed, 2-D mirror tilt stage

 #6 | 2006-11-02 ✅ Patent 7,239,443 granted on 2007-07-03
US20060245045A1
Physics

Condenser optic with sacrificial reflective surface

 #7 | 2006-04-25 ✅ Patent 7,034,322 granted on 2006-04-25
US9877329
-

Fluid jet electric discharge source

 #8 | 2006-04-11 ✅ Patent 7,027,226 granted on 2006-04-11
US9956160
-

Diffractive optical element for extreme ultraviolet wavefront control

 #9 | 2006-01-24 ✅ Patent 6,989,629 granted on 2006-01-24
US11040627
-

Method and apparatus for debris mitigation for an electrical discharge source

 #10 | 2005-09-22 ✅ Patent 7,196,771 granted on 2007-03-27
US20050206870A1
Physics

Reticle stage based linear dosimeter

 #11 | 2005-08-09 ✅ Patent 6,927,887 granted on 2005-08-09
US9981500
-

Holographic illuminator for synchrotron-based projection lithography systems

 #12 | 2005-07-21 ✅ Patent 7,081,992 granted on 2006-07-25
US20050157383A1
Physics

Condenser optic with sacrificial reflective surface

 #13 | 2005-06-14 ✅ Patent 6,906,781 granted on 2005-06-14
US10264062
-

Reticle stage based linear dosimeter

 #14 | 2005-05-03 ✅ Patent 6,888,297 granted on 2005-05-03
US10325997
-

Method and apparatus for debris mitigation for an electrical discharge source

 #15 | 2005-04-21 ✅ Patent 7,016,030 granted on 2006-03-21
US20050083515A1
Physics

Extended surface parallel coating inspection method

 #16 | 2005-03-01 ✅ Patent 6,861,273 granted on 2005-03-01
US9846150
-

Method of fabricating reflection-mode EUV diffusers

 #17 | 2005-02-22 ✅ Patent 6,859,263 granted on 2005-02-22
US10377947
-

Apparatus for generating partially coherent radiation

 #18 | 2005-01-25 ✅ Patent 6,847,463 granted on 2005-01-25
US10163477
-

Method and apparatus for detecting the presence and thickness of carbon and oxide layers on EUV reflective surfaces
AssigneeID:

296993 ⎘