Assignee profile:

Samsung Electronics Co.,Ltd.

City:

Gyeonggi-do

Country:

South Korea

Published Applications:

11

Last publication date:

2014-07-31

Patent Grants:

8

Last grant date:

2016-12-06

Top Inventors for applications by Samsung Electronics Co.,Ltd.

These are the the leading inventors for applications assigned to Samsung Electronics Co.,Ltd.:

Recent patent applications by Samsung Electronics Co.,Ltd.

Samsung Electronics Co.,Ltd. based in Gyeonggi-do, KR has been assigned the rights to these inventions. The list includes both Pending Applications and Patent Grants:

#1 | 2014-07-31 ✅ Patent 9,515,758 granted on 2016-12-06
US20140211671A1
Electricity

Method and apparatus for transmitting control channel in intra-cell carrier aggregation system

#2 | 2013-07-11 ✅ Patent 9,049,548 granted on 2015-06-02
US20130178247A1
Electricity

Method and apparatus for setting information in mobile terminal

#3 | 2010-06-03 ✅ Patent 8,566,405 granted on 2013-10-22
US20100138484A1
Electricity

Method and system for controlling session for interworking in converged IP messaging service

#4 | 2010-03-04
US20100056116A1
Electricity

METHOD AND SYSTEM FOR DISPLAYING INFORMATION COLLECTED BY PORTABLE TERMINALS

#5 | 2010-03-04
US20100054130A1
Physics

Data Flow Management Device Transmitting a Plurality of Data Flows

#6 | 2008-02-14
US20080037416A1
Electricity

Portable terminal and method for multitasking

#7 | 2006-09-14 ✅ Patent 7,532,599 granted on 2009-05-12
US20060203777A1
Electricity

Apparatus and method for allocating user in a multiple antenna mobile communication system supporting multi-user diversity

#8 | 2005-07-28 ✅ Patent 7,430,244 granted on 2008-09-30
US20050163243A1
Electricity

Constellation-rotating orthogonal space-time block coding technique

#9 | 2005-04-28 ✅ Patent 7,162,257 granted on 2007-01-09
US20050090269A1
Electricity

Fast paging method in a code division multiple access mobile communication system

#10 | 2005-02-03 ✅ Patent 7,067,237 granted on 2006-06-27
US20050023957A1
Physics

Method for forming pattern of one-dimensional nanostructure

#11 | 2005-01-20 ✅ Patent 7,057,002 granted on 2006-06-06
US20050014009A1
Electricity

Siloxane-based resin containing germanium and an interlayer insulating film for a semiconductor device using the same

AssigneeID:

29965 ⎘