Tokyo
Japan
7
2026-06-04
3
2026-05-26
These are the the leading inventors for applications assigned to AWL, Inc.:
AWL, Inc. based in Tokyo, JP has been assigned the rights to these inventions. The list includes both Pending Applications and Patent Grants:
IMAGE PROCESSING SYSTEM AND NON-TRANSITORY COMPUTER-READABLE RECORDING MEDIUM FOR RECORDING IMAGE PROCESSING PROGRAM
#2 | 2026-06-04OBJECT RECOGNITION SYSTEM AND NON-TRANSITORY COMPUTER-READABLE RECORDING MEDIUM FOR RECORDING OBJECT RECOGNITION PROGRAM
#3 | 2025-07-17OBJECT TRACKING PARAMETER SETTING SUPPORT SYSTEM, MULTI-CAMERA OBJECT TRACKING SYSTEM, OBJECT TRACKING SYSTEM, NON-TRANSITORY COMPUTER READABLE RECORDING MEDIUM RECORDING OBJECT TRACKING PARAMETER SETTING SUPPORT PROGRAM, NON-TRANSITORY COMPUTER READABLE RECORDING MEDIUM RECORDING MULTI-CAMERA OBJECT TRACKING PROGRAM, AND NON-TRANSITORY COMPUTER READABLE RECORDING MEDIUM RECORDING OBJECT TRACKING PROGRAM
#4 | 2024-07-04 ✅ Patent 12,639,082 granted on 2026-05-26PIPELINE PROCESSING SYSTEM AND NON-TRANSITORY COMPUTER READABLE RECORDING MEDIUM FOR RECORDING PIPELINE PROCESSING PROGRAM
#5 | 2024-03-07DATASET GENERATION SYSTEM, SERVER, AND NON-TRANSITORY COMPUTER-READABLE RECORDING MEDIUM RECORDING DATASET GENERATION PROGRAM
#6 | 2023-04-27 ✅ Patent 12,468,757 granted on 2025-11-11GROUP-SPECIFIC MODEL GENERATION SYSTEM, SERVER, AND NON-TRANSITORY COMPUTER-READABLE RECORDING MEDIUM FOR RECORDING GROUP-SPECIFIC MODEL GENERATION PROGRAM
#7 | 2021-11-04 ✅ Patent 11,682,037 granted on 2023-06-20Signage control system and non-transitory computer-readable recording medium for recording signage control program
Also check out AWL, Inc.'s (Tokyo, Japan) applicant profile with 7 patent applications submitted.
316959 ⎘