NEXCHIP SEMICONDUCTOR CORPORATION

City:

HEFEI

Country:

China

Published Applications:

Last publication date:

2023-12-21

Patent Grants:

Last grant date:

2026-05-19

Top Inventors for applications by NEXCHIP SEMICONDUCTOR CORPORATION

These are the the leading inventors for applications assigned to NEXCHIP SEMICONDUCTOR CORPORATION:

Chih-Hsien Huang 1 Anhui, China
Kuotung Yang 1 Anhui, China
KE YUAN 1 HEFEI, China
CHENG-XIAN YANG 1 HEFEI, China

Cheng-Xian Yang 1 Anhui, China
CHENGWEI LIN 1 HEFEI, China
CHIH-HSIEN HUANG 1 Hefei, China
BAOYOU GONG 1 HEFEI, China

Yucheng Lin 1 Anhui, China
KUOTUNG YANG 1 HEFEI, China
Hui Liu 1 Anhui, China
JIAN-ZHI FANG 1 Hefei, China

Baoyou Gong 1 Anhui, China
Ke Yuan 1 Anhui, China
Jian-Zhi Fang 1 Anhui, China
CHI-CHERNG JENG 1 Taiwan, China

Chihchiang Yang 1 Anhui, China
TZUJEN LIN 1 HEFEI, China
YUCHENG LIN 1 HEFEI, China
Tzujen Lin 1 Anhui, China

Chengwei Lin 1 Anhui, China
WEI PANG CHEN 1 Taiwan, China
CHIHCHIANG YANG 1 HEFEI, China
Hui Liu 1 Hefei, China

CHIH-NAN WU 1 Taiwan, China

Recent patent applications by NEXCHIP SEMICONDUCTOR CORPORATION

NEXCHIP SEMICONDUCTOR CORPORATION based in HEFEI, CN has been assigned the rights to these inventions. The list includes both Pending Applications and Patent Grants:

#1 | 2023-12-21 ✅ Patent 12,635,486 granted on 2026-05-19

US20230411204A1

Electricity

Semiconductor device and manufacturing method thereof

#2 | 2022-03-24 ✅ Patent 11,901,217 granted on 2024-02-13

US20220093450A1

Electricity

Method and apparatus for making shallow trench structure

#3 | 2022-03-17 ✅ Patent 12,259,661 granted on 2025-03-25

US20220082951A1

Physics

Overlay mark, overlay marking method and overlay measuring method

#4 | 2022-03-10 ✅ Patent 11,876,001 granted on 2024-01-16

US20220076966A1

Electricity

Method and system for manufacturing semiconductor layer

AssigneeID:

321541 ⎘