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Assignee profile:

Kowa Co., Ltd.

City:

Nagoya

Country:

Japan

Published Applications:

Last publication date:

2007-02-13

Patent Grants:

Last grant date:

2007-02-13

Top Inventors for applications by Kowa Co., Ltd.

These are the the leading inventors for applications assigned to Kowa Co., Ltd.:

Shunji Takemura 4 Hachioji, Japan
Yoshinori Kyotani 4 Higashiyamato, Japan
Takahiro Kitamura 3 Higashimurayama, Japan
Yukiyoshi Yamazaki 3 Tokyo, Japan

Yukiyoshi Yamazaki 3 Higashimurayama, Japan
Kyoko Yasuoka 3 Higashiyamato, Japan
Tomoyuki Koshi 3 Shiki, Japan
Junko Totsuka 3 Asaka, Japan

Seiichi Sato 3 Tokyo, Japan
Hiromichi Shigyo 3 Fuchu, Japan
Hideo Yoshizaki 3 Sayama, Japan
Kimiyuki Shibuya 2 Tokorozawa, Japan

Hidefumi Ozawa 2 Hachiouji, Japan
Manabu Shibasaki 2 Chiba, Japan
Ayumu Okuda 2 Tokyo, Japan
Hidefumi OZAWA 2 Tokyo, Japan

Kazutoyo Abe 2 Mitaka, Japan
Ayumu Okuda 2 Higashimurayama, Japan
Toru Miura 2 Tokyo, Japan
Toru Miura 2 Higashimurayama, Japan

Soichi Oda 2 Nishikasugai-gun, Japan
Hiroyuki Ishiwata 2 Ichikawa, Japan
Seiichi Sato 2 Suginami-ku, Japan
Kimiyuki Shibuya 2 Tokorozawa-shi, Japan

Soichi Oda 2 Higashimurayama, Japan
Masahiro Nishikawa 2 Nagoya-shi, Japan
Masahiro Nishikawa 2 Nagoya, Japan
Takaaki Araki 2 Higashimurayama, Japan

Tsutomu Toma 2 Tokyo, Japan
Tsutomu Toma 2 Kodaira, Japan
Makoto Suda 2 Higashimurayama, Japan
Kazutoyo Abe 2 Tokyo, Japan

Mototsugu Kabeya 2 Higashimurayama, Japan
Takaaki Araki 2 Tokyo, Japan
Takeshi Doi 1 Higashimurayama, Japan
Junji Yamaguchi 1 Tokyo, Japan

Soichi Oda 1 Nishibiwajima, Japan
Masahiro NISHIKAWA 1 Tokyo, Japan
Hideo Yoshizaki 1 Sayama-shi, Japan
Makoto Suda 1 Higashimurayama-shi, Japan

Takahiro Kitamura 1 Higashimurayama-shi, Japan
Kimiyuki Shibuya 1 Saitama, Japan
Yusuke Sasaki 1 Higashimurayama, Japan
Masao Ohkuchi 1 Tokorozawa, Japan

Tatsuhiko Kodama 1 Setagaya-ku, Japan
Soichi Oda 1 Aichi, Japan
Tadaaki Ohgiya 1 Tokorozawa, Japan
Yukihiro SATO 1 Tokyo, Japan

Taro Aoki 1 Tokorozawa, Japan
Tadaaki Ohgiya 1 Saitama, Japan
Tomoyuki Koshi 1 Shiki-shi, Japan
Takeshi Doi 1 Tokyo, Japan

Taro Aoki 1 Tokorozawa-shi, Japan
Manabu Shibasaki 1 Chiba-shi, Japan
Junko Totsuka 1 Asaka-shi, Japan
Shunji Takemura 1 Hachioji-shi, Japan

Toshiaki Oda 1 Higashimurayama, Japan
Junji Yamaguchi 1 Higashimurayama, Japan
Masahiro TAMURA 1 Tokyo, Japan
Yoshinori Kyotani 1 Tokyo, Japan

Hiroyuki Ishiwata 1 Ichikawa-shi, Japan
Toshiaki Oda 1 Tokyo, Japan
Yusuke SASAKI 1 Tokyo, Japan
Kineo Matsui 1 Yokosuka, Japan

Hiromichi Shigyo 1 Fuchu-shi, Japan
Soichi Oda 1 Higashimurayama-shi, Japan
Toru Miura 1 Higashimurayama-shi, Japan
Kyoko Yasuoka 1 Higashiyamato-shi, Japan

Masahiro Tamura 1 Higashimurayama, Japan
Tatsuhiko KODAMA 1 Tokyo, Japan
Yoshinori Kyotani 1 Higashiyamato-shi, Japan
Mototsugu Kabeya 1 Higashimurayama-shi, Japan

Masahiro Nishikawa 1 Higashimurayama, Japan
Yukihiro Sato 1 Nerima-ku, Japan
Tadaaki Ohgiya 1 Tokorozawa-shi, Japan

Recent patent applications by Kowa Co., Ltd.

Kowa Co., Ltd. based in Nagoya, JP has been assigned the rights to these inventions. The list includes both Pending Applications and Patent Grants:

#1 | 2007-02-13 ✅ Patent 7,176,306 granted on 2007-02-13

US10733243

Hydroxyalkyl cyclic diamine compound

#2 | 2006-11-14 ✅ Patent 7,135,473 granted on 2006-11-14

US10639457

Cyclic diamine compound with condensed-ring groups

#3 | 2006-08-24 ✅ Patent 7,183,295 granted on 2007-02-27

US20060189667A1

Chemistry; metallurgy

PPAR-activating compound and pharmaceutical composition comprising the compound

#4 | 2005-12-06 ✅ Patent 6,973,195 granted on 2005-12-06

US9830236

Method for embedding electronic watermark and method for decoding the same

#5 | 2005-08-25 ✅ Patent 7,022,713 granted on 2006-04-04

US20050187292A1

Human necessities

Hyperlipemia therapeutic agent

#6 | 2005-07-28 ✅ Patent 7,163,944 granted on 2007-01-16

US20050165026A1

Chemistry; metallurgy

Cyclic diamine compound and pharmaceutical containing the same

#7 | 2005-05-12 ✅ Patent 7,109,226 granted on 2006-09-19

US20050101636A1

Chemistry; metallurgy

PPAR-activating compound and pharmaceutical composition comprising the compound

#8 | 2005-05-12 ✅ Patent 7,196,101 granted on 2007-03-27

US20050101634A1

Chemistry; metallurgy

Bis(5-aryl-2-pyridyl) derivatives

#9 | 2005-05-10 ✅ Patent 6,890,940 granted on 2005-05-10

US9893680

Bis(2-aryl-5-pyridyl) derivatives

#10 | 2005-04-21 ✅ Patent 7,087,606 granted on 2006-08-08

US20050085480A1

Chemistry; metallurgy

Water-soluble phenylpyridazine compounds and compositions containing the same

#11 | 2005-03-22 ✅ Patent 6,869,954 granted on 2005-03-22

US10253523

Water-soluble phenylpyridazine compounds and compositions containing the same

#12 | 2005-03-15 ✅ Patent 6,867,221 granted on 2005-03-15

US10191534

Cyclic amine compounds and pharmaceutical composition containing the same

#13 | 2005-03-01 ✅ Patent 6,861,428 granted on 2005-03-01

US10396726

Water-soluble phenylpyridazine compounds and compositions containing the same

#14 | 2005-02-10 ✅ Patent 6,998,486 granted on 2006-02-14

US20050032814A1

Chemistry; metallurgy

Process for production of cyclic diamine compounds or salts thereof

AssigneeID:

362536 ⎘