Assignee profile:

Nomura Micro Science Co., Ltd.

City:

Atsugi

Country:

Japan

Published Applications:

9

Last publication date:

2025-03-20

Patent Grants:

9

Last grant date:

2026-04-21

Top Inventors for applications by Nomura Micro Science Co., Ltd.

These are the the leading inventors for applications assigned to Nomura Micro Science Co., Ltd.:

Recent patent applications by Nomura Micro Science Co., Ltd.

Nomura Micro Science Co., Ltd. based in Atsugi, JP has been assigned the rights to these inventions. The list includes both Pending Applications and Patent Grants:

#1 | 2025-03-20 ✅ Patent 12,606,475 granted on 2026-04-21
US20250091925A1
Chemistry; metallurgy

PRODUCTION METHOD AND PRODUCTION DEVICE FOR WATER FOR PURE WATER, AND PRODUCTION METHOD AND PRODUCTION SYSTEM FOR PURE WATER

#2 | 2025-02-13 ✅ Patent 12,570,555 granted on 2026-03-10
US20250051198A1
Chemistry; metallurgy

METHOD AND APPARATUS FOR PRODUCING WATER FOR PURE WATER, METHOD FOR PRODUCING PURE WATER, AND PURE WATER PRODUCTION SYSTEM

#3 | 2023-08-03 ✅ Patent 12,577,132 granted on 2026-03-17
US20230242419A1
Chemistry; metallurgy

ULTRAPURE WATER PRODUCTION SYSTEM AND ULTRAPURE WATER PRODUCTION METHOD

#4 | 2023-03-30 ✅ Patent 12,547,079 granted on 2026-02-10
US20230101477A1
Physics

RESIST STRIPPING METHOD, RESIST STRIPPING DEVICE, AND PRETREATMENT METHOD

#5 | 2021-02-11 ✅ Patent 11,817,309 granted on 2023-11-14
US20210043440A1
Electricity

Method of producing heated ozone water, heated ozone water, and semiconductor wafer-cleaning liquid

#6 | 2019-05-30 ✅ Patent 10,865,130 granted on 2020-12-15
US20190161371A1
Chemistry; metallurgy

Apparatus and method for producing alkaline water for cleaning electronic device

#7 | 2005-10-13 ✅ Patent 7,043,394 granted on 2006-05-09
US20050228610A1
Physics

Method and device for measuring fine particles in ultrapure water

#8 | 2005-05-24 ✅ Patent 6,896,927 granted on 2005-05-24
US10318003
-

Method of preventing organic contamination from the atmosphere of electronic device substrates and electronic device substrates treated therewith

#9 | 2005-02-08 ✅ Patent 6,851,873 granted on 2005-02-08
US10683288
-

Method and apparatus for removing organic films

Also check out NOMURA MICRO SCIENCE CO., LTD.'s (Atsugi, Japan) applicant profile with 6 patent applications submitted.

AssigneeID:

364159 ⎘