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Assignee profile:

GENERAL PLASMA, INC.

City:

Tucson, Arizona

Country:

United States

Published Applications:

16

Last publication date:

2018-05-24

Patent Grants:

12

Last grant date:

2021-08-17

Top Inventors for applications by GENERAL PLASMA, INC.

These are the the leading inventors for applications assigned to GENERAL PLASMA, INC.:

Recent patent applications by GENERAL PLASMA, INC.

GENERAL PLASMA, INC. based in Tucson, US has been assigned the rights to these inventions. The list includes both Pending Applications and Patent Grants:

#1 | 2018-05-24 ✅ Patent 11,092,245 granted on 2021-08-17
US20180142791A1
Mechanical engineering

Chamber valve

 #2 | 2018-04-26 ✅ Patent 10,989,343 granted on 2021-04-27
US20180112808A1
Mechanical engineering

Push-to-connect and pull-to-disconnect quick coupling

 #3 | 2017-11-30 ✅ Patent 10,811,236 granted on 2020-10-20
US20170345628A1
Electricity

Magnetic anode for sputter magnetron cathode

 #4 | 2016-10-06 ✅ Patent 10,273,570 granted on 2019-04-30
US20160289820A1
Chemistry; metallurgy

Rotary magnetron magnet bar and apparatus containing the same for high target utilization

 #5 | 2016-05-26 ✅ Patent 10,134,557 granted on 2018-11-20
US20160148775A1
Electricity

Linear anode layer slit ion source

 #6 | 2015-08-20
US20150235821A1
Electricity

UNIFORM FORCE FLANGE CLAMP

 #7 | 2013-08-29
US20130220797A1
Chemistry; metallurgy

HIGH TARGET UTILIZATION MOVING MAGNET PLANAR MAGNETRON SCANNING METHOD

 #8 | 2012-10-18 ✅ Patent 9,388,490 granted on 2016-07-12
US20120261253A1
Chemistry; metallurgy

Rotary magnetron magnet bar and apparatus containing the same for high target utilization

 #9 | 2011-09-29
US20110236591A1
Electricity

BIPOLAR RECTIFIER POWER SUPPLY

 #10 | 2011-09-22 ✅ Patent 9,136,086 granted on 2015-09-15
US20110226611A1
Electricity

Closed drift magnetic field ion source apparatus containing self-cleaning anode and a process for substrate modification therewith

 #11 | 2011-01-13 ✅ Patent 9,103,018 granted on 2015-08-11
US20110005919A1
Chemistry; metallurgy

Sputtering target temperature control utilizing layers having predetermined emissivity coefficients

 #12 | 2010-08-19 ✅ Patent 8,304,744 granted on 2012-11-06
US20100207529A1
Electricity

Closed drift ion source

 #13 | 2010-06-24 ✅ Patent 8,535,490 granted on 2013-09-17
US20100155226A1
Electricity

Rotatable magnetron sputtering with axially movable target electrode tube

 #14 | 2009-02-05
US20090032393A1
Electricity

Mirror Magnetron Plasma Source

 #15 | 2007-02-01 ✅ Patent 7,932,678 granted on 2011-04-26
US20070026161A1
Electricity

Magnetic mirror plasma source and method using same

 #16 | 2006-01-05 ✅ Patent 7,993,496 granted on 2011-08-09
US20060000705A1
Electricity

Cylindrical target with oscillating magnet for magnetron sputtering

Also check out General Plasma, Inc.'s (Tucson, United States) applicant profile with 5 patent applications submitted.

AssigneeID:

36525 ⎘