Yokohama
Japan
9
2023-06-08
9
2026-02-17
These are the the leading inventors for applications assigned to Tasmit, Inc.:
Tasmit, Inc. based in Yokohama, JP has been assigned the rights to these inventions. The list includes both Pending Applications and Patent Grants:
PATTERN DEFECT DETECTION METHOD
#2 | 2023-05-11 ✅ Patent 12,387,341 granted on 2025-08-12PATTERN MATCHING METHOD
#3 | 2023-01-05 ✅ Patent 12,243,237 granted on 2025-03-04Pattern-edge detection method, pattern-edge detection apparatus, and storage medium storing program for causing a computer to perform pattern-edge detection
#4 | 2021-02-11 ✅ Patent 11,468,555 granted on 2022-10-11Method and apparatus for generating a correction line indicating relationship between deviation of an edge of a wafer pattern from an edge of a reference pattern and space width of the reference pattern, and a computer-readable recording medium
#5 | 2021-01-28 ✅ Patent 11,380,513 granted on 2022-07-05Autofocus method for a scanning electron microscope
#6 | 2021-01-28 ✅ Patent 11,436,736 granted on 2022-09-06Pattern edge detection method
#7 | 2021-01-14 ✅ Patent 11,322,332 granted on 2022-05-03Apparatus and method for measuring energy spectrum of backscattered electrons
#8 | 2019-02-28 ✅ Patent 10,614,999 granted on 2020-04-07Image generation method
#9 | 2019-01-24 ✅ Patent 10,802,073 granted on 2020-10-13Pattern defect detection method
Also check out TASMIT, INC.'s (Yokohama, Japan) applicant profile with 10 patent applications submitted.
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