Kyoto
Japan
8
2023-07-27
8
2025-09-23
These are the the leading inventors for applications assigned to SAN APRO LTD.:
SAN APRO LTD. based in Kyoto, JP has been assigned the rights to these inventions. The list includes both Pending Applications and Patent Grants:
NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMATION METHOD, AND LAMINATED FILM
#2 | 2023-03-30 ✅ Patent 12,461,444 granted on 2025-11-04SULFONIUM SALT, PHOTOACID GENERATOR, CURABLE COMPOSITION, AND RESIST COMPOSITION
#3 | 2022-10-06 ✅ Patent 12,662,450 granted on 2026-06-23NOVEL ONIUM SALT AND PHOTOACID GENERATOR
#4 | 2022-03-24 ✅ Patent 12,129,240 granted on 2024-10-29Sulfonium salt, photoacid generator, curable composition and resist composition
#5 | 2019-09-19 ✅ Patent 11,370,751 granted on 2022-06-28Sulfonium salt, heat- or photo-acid generator, heat- or photo-curable composition, and cured product thereof
#6 | 2016-10-13 ✅ Patent 9,933,701 granted on 2018-04-03Photobase generator
#7 | 2011-12-08 ✅ Patent 8,617,787 granted on 2013-12-31Sulfonium salt, photo-acid generator, and photosensitive resin composition
#8 | 2007-03-15 ✅ Patent 8,338,074 granted on 2012-12-25Actinic radiation-curable stereolithographic resin composition having improved stability
Also check out SAN APRO LTD.'s (Kyoto, Japan) applicant profile with 5 patent applications submitted.
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