South Korea
19
2016-01-07
19
2016-08-23
These are the the leading inventors for applications assigned to Dongjin Semichem Co., Ltd.:
Dongjin Semichem Co., Ltd. based in , KR has been assigned the rights to these inventions. The list includes both Pending Applications and Patent Grants:
Composition for forming resist protection film for lithography and method for forming pattern of semiconductor device using the same
#2 | 2014-10-30 ✅ Patent 9,170,495 granted on 2015-10-27Phenol monomer, polymer for forming a resist underlayer film including same, and composition for a resist underlayer film including same
#3 | 2013-09-26 ✅ Patent 8,859,194 granted on 2014-10-14Polymer compound, and resist-protecting film composition including same for a liquid immersion exposure process
#4 | 2012-01-05 ✅ Patent 8,551,684 granted on 2013-10-08Polymer for forming resist protection film, composition for forming resist protection film, and method of forming patterns of semiconductor devices using the composition
#5 | 2010-09-16 ✅ Patent 8,293,458 granted on 2012-10-23Method for forming fine pattern in semiconductor device
#6 | 2010-09-02 ✅ Patent 8,173,729 granted on 2012-05-08Photosensitive resin composition
#7 | 2009-02-12 ✅ Patent 7,989,136 granted on 2011-08-02Photoresist composition and method of forming a photoresist pattern using the same
#8 | 2009-02-12 ✅ Patent 8,187,769 granted on 2012-05-29Supported catalyst for fuel cell, method of preparing the same, electrode for fuel cell including the supported catalyst, membrane electrode assembly including the electrode, and fuel cell including the membrane electrode assembly
#9 | 2008-02-28 ✅ Patent 7,763,402 granted on 2010-07-27Photosensitive resin composition
#10 | 2007-08-09 ✅ Patent 7,985,782 granted on 2011-07-26Ink for color filter, method of fabricating color filter using the ink, and color filter fabricated by the method
#11 | 2006-12-28 ✅ Patent 7,501,222 granted on 2009-03-10Photoresist monomer polymer thereof and photoresist composition including the same
#12 | 2006-09-07 ✅ Patent 7,282,530 granted on 2007-10-16Polymer for forming anti-reflective coating layer
#13 | 2006-09-07 ✅ Patent 7,465,531 granted on 2008-12-16Polymer for forming anti-reflective coating layer
#14 | 2006-09-07 ✅ Patent 7,309,561 granted on 2007-12-18Polymer for forming anti-reflective coating layer
#15 | 2006-06-22 ✅ Patent 7,368,219 granted on 2008-05-06Polymer for forming anti-reflective coating layer
#16 | 2006-03-16 ✅ Patent 7,419,761 granted on 2008-09-02Photoresist monomer having spiro cyclic ketal group, polymer thereof and photoresist composition including the same
#17 | 2006-01-19 ✅ Patent 7,300,606 granted on 2007-11-27Pb free Ag paste composition for PDP address electrode
#18 | 2006-01-12 ✅ Patent 7,195,854 granted on 2007-03-27Photoresist composition
#19 | 2005-11-17 ✅ Patent 7,378,223 granted on 2008-05-27Photoresist resin composition
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